Shinya Wakamizu
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72743M (2009) https://doi.org/10.1117/12.814112
KEYWORDS: Contamination, Semiconducting wafers, Particles, Bridges, Thin film coatings, High volume manufacturing, Coating, Immersion lithography, Process control, Image filtering

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714039 (2008) https://doi.org/10.1117/12.804675
KEYWORDS: Immersion lithography, Semiconducting wafers, Particles, Coating, Lithography, Photoresist processing, Thin film coatings, Scanners, Scanning electron microscopy, Semiconductors

Proceedings Article | 4 April 2008 Paper
Nobuji Matsumura, Norihiko Sugie, Kentaro Goto, Koichi Fujiwara, Yoshikazu Yamaguchi, Hirokazu Tanizaki, Katsushi Nakano, Tomoharu Fujiwara, Shinya Wakamizu, Hirofumi Takeguchi, Hiroshi Arima, Hideharu Kyoda, Kosuke Yoshihara, Junichi Kitano
Proceedings Volume 6923, 69230D (2008) https://doi.org/10.1117/12.771795
KEYWORDS: Lithography, Immersion lithography, Thin film coatings, 193nm lithography, Semiconducting wafers, Bridges, Defect inspection, Photoresist processing, Line width roughness, Semiconductors

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6519, 65190C (2007) https://doi.org/10.1117/12.711853
KEYWORDS: Thin film coatings, Immersion lithography, Semiconducting wafers, Photoresist processing, Silicon, Scanning electron microscopy, Lithography, Image processing, Semiconductors, Data processing

Proceedings Article | 22 March 2007 Paper
Proceedings Volume 6519, 651924 (2007) https://doi.org/10.1117/12.711354
KEYWORDS: Etching, Immersion lithography, Photoresist processing, Semiconducting wafers, Lithography, Thin film coatings, Scanning electron microscopy, Defect inspection, Photography, Lens design

Showing 5 of 7 publications
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