Mr. Sungchul Yoo Profile

Sungchul Yoo

at KLA Corp

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 13 March 2018 Paper

Clean focus, dose and CD metrology for CD uniformity improvement

Honggoo Lee , Sangjun Han, Minhyung Hong, Seungyoung Kim, Jieun Lee, DongYoung Lee, Eungryong Oh, Ahlin Choi, Nakyoon Kim, John Robinson, Markus Mengel , Rovira Pablo , Sungchul Yoo, Raphael Getin, Dongsub Choi, Sanghuck Jeon

Proceedings Volume 10585, 105852A (2018) https://doi.org/10.1117/12.2299976

KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Scanners, Process control, Modulation, Scatterometry, Finite element methods, Signal to noise ratio, Single crystal X-ray diffraction

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Proceedings Article | 19 March 2015 Paper

Lithography process controllers and photoresist monitoring by signal response metrology (SRM)

He Rong Yang, Tang Chun Weng, Wei-Jhe Tzai, Chien-Hao Chen, Chun-Chi Yu, Wei-Yuan Chu, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng

Proceedings Volume 9424, 94242C (2015) https://doi.org/10.1117/12.2085271

KEYWORDS: Semiconducting wafers, Photoresist materials, Metrology, Signal processing, Process control, Single crystal X-ray diffraction, Scanners, Critical dimension metrology, Lithography, Data modeling

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Proceedings Article | 2 April 2014 Paper

Metrology of advanced N14 process pattern split at lithography

Wei-Jhe Tzai, Chia-Ching Lin, Chien-Hao Chen, Chun Chi Yu, Wei-Yuan Chu, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng, Hsiao-Fei Su

Proceedings Volume 9050, 90502R (2014) https://doi.org/10.1117/12.2046617

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Overlay metrology, Metrology, Semiconducting wafers, Photomasks, Oxides, Light sources, Etching, Photoresist materials

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Proceedings Article | 10 April 2013 Paper

Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

Wei-Jhe Tzai, Howard Chen, Jun-Jin Lin, Yu-Hao Huang, Chun-Chi Yu, Ching-Hung Bert Lin, Sungchul Yoo, Chien-Jen Eros Huang, Lanny Mihardja

Proceedings Volume 8681, 86811T (2013) https://doi.org/10.1117/12.2011620

KEYWORDS: Single crystal X-ray diffraction, Semiconducting wafers, Critical dimension metrology, Metrology, Scatterometry, Process control, Control systems, 3D modeling, 3D metrology, Inspection

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Proceedings Article | 5 April 2012 Paper

Apply multiple target for advanced gate ADI critical dimension measurement by scatterometry technology

Wei-Jhe Tzai, Howard Chen, Yu-Hao Huang, Chun-Chi Yu, Ching-Hung Lin, Shi-Ming Wei, Zhi-Qing Xu, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng, Juli Cheng, Lanny Mihardja, Houssam Chouaib

Proceedings Volume 8324, 832420 (2012) https://doi.org/10.1117/12.916234

KEYWORDS: Semiconducting wafers, Single crystal X-ray diffraction, Finite element methods, Metrology, Scatter measurement, Scatterometry, Modulation, Critical dimension metrology, High volume manufacturing, Inspection

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Proceedings Article | 5 April 2012 Paper

Fast and accurate scatterometry metrology method for STI CMP step height process evaluation

Chih-Hsun Lin, Climbing Huang, Chia-Lin Hsu, Wu-Sian Sie, J. Y. Wu, Ching-Hung Lin, Zhi-Qing Xu, Qiong-Yan Yuan, Sungchul Yoo, Chien-Jen Huang, Chao-Yu Cheng, Juli Cheng, Zhiming Jiang, Houssam Chouaib

Proceedings Volume 8324, 832421 (2012) https://doi.org/10.1117/12.916235

KEYWORDS: Semiconducting wafers, Metrology, Scatterometry, Single crystal X-ray diffraction, Chemical mechanical planarization, Diffractive optical elements, Process control, Scatter measurement, Inspection, Transmission electron microscopy

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Proceedings Article | 20 April 2011 Paper

Metrology of micro-step height structures using 3D scatterometry in 4x-nm advance DRAM

Mason Duan, Clark Chen, Calvin Hsu, Elvis Wang, ZhiQing Xu, Elsie Yu, Qiongyan Yuan, Sungchul Yoo, Zhengquan Tan

Proceedings Volume 7971, 79712J (2011) https://doi.org/10.1117/12.881322

KEYWORDS: Single crystal X-ray diffraction, Atomic force microscopy, Scatterometry, Metrology, Etching, 3D metrology, Chemical mechanical planarization, Optical lithography, Oxides, Process control

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Proceedings Article | 20 April 2011 Paper

Scatterometry measurement for gate ADI and AEI critical dimension of 28-nm metal gate technology

Yu-Hao Huang, Howard Chen, Kyle Shen, H. H. Chen, Chun Chi Yu, J. H. Liao, Xiafang Zhang, Russell Teo, Zhi-Qing Xu, Sungchul Yoo, Ching-Hung Lin, Chao-Yu Cheng, Jason Lin

Proceedings Volume 7971, 79712O (2011) https://doi.org/10.1117/12.879480

KEYWORDS: Semiconducting wafers, Metals, Scatterometry, Single crystal X-ray diffraction, Transmission electron microscopy, Diffractive optical elements, Magnesium, Scatter measurement, Metrology, Critical dimension metrology

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Showing 5 of 8 publications

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