Sunghyun Oh
at SK Hynix Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96351T (2015) https://doi.org/10.1117/12.2196938
KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

Proceedings Article | 29 October 2014 Paper
Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283
KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482Q (2014) https://doi.org/10.1117/12.2046571
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

Proceedings Article | 8 June 2010 Paper
Sunghyun Oh, DaeHo Hwang, Inpyo Kim, Changreol Kim, Aviram Tam, Michael Ben Yishai, Yulian Wolff
Proceedings Volume 7748, 774827 (2010) https://doi.org/10.1117/12.869574
KEYWORDS: Inspection, Photomasks, SRAF, Defect detection, Image resolution, Critical dimension metrology, Airborne remote sensing, Artificial intelligence, Optics manufacturing, Signal detection

Proceedings Article | 19 May 2008 Paper
Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim
Proceedings Volume 7028, 70281O (2008) https://doi.org/10.1117/12.793065
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Transmittance, Spatial filters, Image filtering, Image enhancement, Image processing, Error analysis

Showing 5 of 10 publications
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