Dr. Sungseo Cho Profile

Dr. Sungseo Cho

Vice President Development at Samsung SDI Chemicals & Electronic Materials

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Design and study of resist materials for 157-nm lithography

Shintaro Yamada, Sungseo Cho, Anthony Zampini

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485106

KEYWORDS: Polymers, Fluorine, Absorbance, Etching, Lithography, Photoresist materials, Polymerization, Transparency, Chemical species, Silicon

Read Abstract +

Proceedings Article | 24 July 2002 Paper

Investigation of a fluorinated ESCAP-based resist for 157-nm lithography

Sungseo Cho, Axel Klauck-Jacobs, Shintaro Yamada, Cheng-Bai Xu, JoAnne Leonard, Anthony Zampini

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474251

KEYWORDS: Polymers, Absorbance, Etching, Fluorine, Lithography, Resistance, Dry etching, Photoresist materials, Thin films, Oxides

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

Mark Somervell, David Fryer, Brian Osborn, Kyle Patterson, Sungseo Cho, Jeff Byers, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388311

KEYWORDS: Polymers, Line edge roughness, Glasses, Semiconducting wafers, Imaging systems, Etching, FT-IR spectroscopy, Photoresist materials, Image resolution, Absorbance

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Negative-tone 193-nm resists

Sungseo Cho, Anthony Vander Heyden, Jeff Byers, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388343

KEYWORDS: Polymers, Lithography, Nitrogen, Liquids, Switches, Optical lithography, Absorbance, Chemistry, Modulation, Industrial chemicals

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Improving the performance of 193-nm photoresists based on alicyclic polymers

Kyle Patterson, Uzodinma Okoroanyanwu, Tsutomu Shimokawa, Sungseo Cho, Jeff Byers, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312356

KEYWORDS: Polymers, Etching, Photoresist materials, Lithography, Photomasks, Resistance, Photoresist developing, Polymerization, Bioalcohols, Absorbance

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years