Mr. Sungwoo Ko Profile

Sungwoo Ko

Engineer at SK Hynix Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 22 February 2021 Poster + Paper

Enhancing model accuracy and calibration efficiency with image-based pattern selection using machine learning techniques

Ren-Cheng Sun, Dae-Kwon Kang, Chester Jia, Meng Liu, De-Bao Shao, Young-Seok Kim, Jangho Shin, Mark Simmons, Qian Zhao, Mu Feng, Yiqiong Zhao, Shibing Wang, Sungho Kim, Sungwoo Ko, Shinyoung Kim, Jaeseung Choi, Chanha Park

Proceedings Volume 11613, 116130Y (2021) https://doi.org/10.1117/12.2584692

KEYWORDS: Calibration, Machine learning, Signal processing, Physics, Optical proximity correction, Metrology, Lithography, Computational lithography

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Proceedings Article | 26 March 2019 Presentation + Paper

OPC model accuracy study using high volume contour based gauges and deep learning on memory device

Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park

Proceedings Volume 10959, 1095913 (2019) https://doi.org/10.1117/12.2515274

KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers

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Proceedings Article | 31 March 2014 Paper

Model-based pattern dummy generation for logic devices

Jongwon Jang, Cheolkyun Kim, Sungwoo Ko, Seokyoung Byun, Hyunjo Yang, Donggyu Yim

Proceedings Volume 9052, 90521W (2014) https://doi.org/10.1117/12.2046198

KEYWORDS: SRAF, Model-based design, Metals, Instrument modeling, Lithography, Logic devices, Optical proximity correction, Shape memory alloys, Logic, Semiconducting wafers

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Proceedings Article | 20 May 2006 Paper

The study of contact hole for 65nm node with KrF

Tae-Jun You, Sung-Woo Ko, James Moon, Yeong-Bae Ahn, Byung-Ho Nam, Dong-Gyu Yim

Proceedings Volume 6283, 628336 (2006) https://doi.org/10.1117/12.681825

KEYWORDS: SRAF, Optical lithography, Photomasks, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Lithography, Light sources, Phase shifts, Manufacturing

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Conference Committee Involvement (2)

DTCO and Computational Patterning II

27 February 2023 | San Jose, California, United States

DTCO and Computational Patterning

26 April 2022 | San Jose, California, United States

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