Since the design nodes gradually decreased and EUV production became reality, the data volume is continuously increasing due to Hard OPC & Flare Correction. Multi-Beam Mask Writers (MBMW) enabled mask exposures with curvilinear and circle pattern that have not been possible before. This soon led to an increase in the number of vertexes of design data and an increase in Mask Data Preparation turnaround times (MDP TAT). A data flow based on the newly developed MBW-2 file format was developed jointly with Nippon Control System and IMS nanofabrication and significantly improved MDP TAT. The effect was confirmed by verifying it with actual data using large-volume data and curvilinear data EUV masks exposed on MBMW. In addition, the MDP TAT was further improved by studying file write method. In this paper, we introduce the concept and application of the new data flow. Furthermore we will present the results on TAT and output file sizes. Finally, we will discuss each step in the data flow in detail.
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