Dr. Takahiro Ikeda Profile

Dr. Takahiro Ikeda

at Toshiba Corp

SPIE Involvement:

Author

Publications (11)

SPIE Journal Paper | 2 October 2014 Open Access

Verification metrology system by using inline reference metrology

Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki

JM3, Vol. 13, Issue 04, 041405, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041405

KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

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Proceedings Article | 2 April 2014 Paper

Verification metrology system by using inline reference metrology

Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki

Proceedings Volume 9050, 90501L (2014) https://doi.org/10.1117/12.2048686

KEYWORDS: Metrology, Scatterometry, Nondestructive evaluation, Inspection, Semiconducting wafers, Scattering, Silicon, X-rays, Scatter measurement, Signal detection

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Proceedings Article | 2 April 2010 Paper

Overlay sampling optimization by operating characteristic curves empirically estimated

Kentaro Kasa, Masafumi Asano, Takahiro Ikeda, Manabu Takakuwa, Nobuhiro Komine, Kazutaka Ishigo

Proceedings Volume 7638, 76382G (2010) https://doi.org/10.1117/12.846344

KEYWORDS: Inspection, Semiconducting wafers, Error analysis, Overlay metrology, Visualization, Statistical analysis, Optimization (mathematics), Semiconductors, Lithography, Metrology

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Proceedings Article | 2 April 2010 Paper

Influence of error distribution shape on process capability analysis

Masafumi Asano, Takahiro Ikeda

Proceedings Volume 7638, 763827 (2010) https://doi.org/10.1117/12.846471

KEYWORDS: Statistical analysis, Critical dimension metrology, Error analysis, Semiconductor manufacturing, Data analysis, Shape analysis, Process control, Metrology, Monte Carlo methods, Tolerancing

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Proceedings Article | 22 March 2008 Paper

Lot acceptance sampling inspection plan for non-normal CD distribution

Takahiro Ikeda, Masafumi Asano

Proceedings Volume 6922, 692214 (2008) https://doi.org/10.1117/12.771878

KEYWORDS: Inspection, Process control, Metrology, Optical lithography, Strontium, Fiber Bragg gratings, Lithography

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SPIE Journal Paper | 1 October 2006

Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

JM3, Vol. 5, Issue 04, 043006, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397034

KEYWORDS: Scanning electron microscopy, Scatterometry, Metrology, Critical dimension metrology, Monte Carlo methods, Inspection, Stereolithography, Manufacturing, Time metrology, Optical proximity correction

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SPIE Journal Paper | 1 July 2006

Sampling plan optimization for critical dimension metrology

Masafumi Asano, Takahiro Ikeda

JM3, Vol. 5, Issue 03, 033008, (July 2006) https://doi.org/10.1117/12.10.1117/1.2242815

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Proceedings Article | 24 March 2006 Paper

Inline CD metrology with combined use of scatterometry and CD-SEM

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

Proceedings Volume 6152, 61521V (2006) https://doi.org/10.1117/12.656326

KEYWORDS: Scatterometry, Critical dimension metrology, Metrology, Scanning electron microscopy, Monte Carlo methods, Inspection, Time metrology, Statistical analysis, Optics manufacturing, Line edge roughness

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Proceedings Article | 5 November 2005 Paper

Mask pattern quality assurance based on lithography simulation with fine pixel SEM image

Mitsuyo Kariya, Eiji Yamanaka, Satoshi Tanaka, Takahiro Ikeda, Shinji Yamaguchi, Kohji Hashimoto, Masamitsu Itoh, Hideaki Kobayashi, Tsukasa Kawashima, Shogo Narukawa

Proceedings Volume 5992, 59921M (2005) https://doi.org/10.1117/12.632611

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Reliability, Lithography, Image quality, Computer aided design, Critical dimension metrology, Image processing, Reticles

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Proceedings Article | 28 June 2005 Paper

Reticle SEM specifications required for lithography simulation

Mitsuyo Kariya, Eiji Yamanaka, Satoshi Tanaka, Takahiro Ikeda, Shinji Yamaguchi, Masamitsu Itoh, Hideaki Kobayashi, Tsukasa Kawashima, Shogo Narukawa

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617130

KEYWORDS: Reticles, Scanning electron microscopy, Semiconducting wafers, Lithography, Optical proximity correction, Distortion, Image quality, Computer simulations, Process modeling, Image processing

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Proceedings Article | 10 May 2005 Paper

Sampling plan optimization for CD control in low k1 lithography

Masafumi Asano, Toru Koike, Toru Mikami, Hideaki Abe, Takahiro Ikeda, Satoshi Tanaka, Shoji Mimotogi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600370

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Error analysis, Lithography, Neptunium, Metrology, Statistical analysis, Manufacturing, Reticles, Process control

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Showing 5 of 11 publications

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