Dr. Takashi Matsunaga Profile

Dr. Takashi Matsunaga

Executive officer at Gigaphoton Inc

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Author

Publications (29)

Proceedings Article | 26 April 2017 Presentation

Will conventional E95% spectral indicator last forever? (Conference Presentation)

Toshihiro Oga, Kenji Takahisa, Takashi Matsunaga, Tatsuo Enami

Proceedings Volume 10147, 101470D (2017) https://doi.org/10.1117/12.2257955

KEYWORDS: Lithography, Chromatic aberrations, Immersion lithography, Optical proximity correction, Light sources, Optical systems, Wafer-level optics, Projection systems, Optical design, Semiconducting wafers

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Fifteen years has passed since ArF lithography technology transitioned to mass production. At first the node size was 130nm, however, now we are discussing one-digit nm node. This node size is one-fifteenth compared to that in the initial generation. It is obvious that generations have steadily changed. Meanwhile, ArF projection optics has been designed with higher NA. Moreover, much higher NA or effectively short wavelength have been achieved by introducing the immersion lithography technology which injects immersion media between the light emission side of optics and the wafer surface. Now that ten years has passed since the immersion lithography technology transitioned to mass production, the requirements for the light source have become much more demanding. This is because E95%, a typical parameter for the light source, which reduces the CD variation and influences the optical characteristics, has been required to be much shorter along with advanced node. The spectrum characteristics of the conventional KrF 248nm-light source were defined with full-width at half maximum (FWHM). After entering ArF era, E95% was defined as more stringent parameter. This new parameter is closely linked to line narrowing and node transition. This E95% is a parameter to define optics monochromaticity and recognized as equivalent to quantified chromatic aberration. More specifically, it is desired to reduce the chromatic aberration ideally down to zero to maximize the contrast by suppressing blur images. Provided that the blur images are caused by not only chromatic aberration but also the convoluted effect of spherical aberration, residual errors of lithography optics system and other defocus elements. In line with this we should take persistent challenges to reduce errors in designing and manufacturing lithography optics systems and drive the chromatic aberration closer to zero. The contrast we discuss in the lithography optics systems strongly correlate to resolution, and thus it is well known that OPC bias is linear with respect to E95% when the resolution is fixed. Although this OPC bias and E95% have been firmly linear with each other, it has also been revealed that the trend of the linearity with much shorter E95% deviates from the conventional trend and shows an inflection point in the near future. We systematically analyze the trend that linearity error tends to be greater than the conventional distribution and suggest solutions to the issue. This systematic analysis includes: 1. Measurement errors and distribution in measuring E95% as the spectrum width 2. Correlation between raw measured spectrum intensity data and E95% 3. Linearity comparison in behaviors between when E95% is approximated by i) +/-2 sigma of, ii)+/-3 sigma of normal spectrum distribution, and iii) by another approximation. Based on these studies, we identify the roles of the light source to contribute to 7nm-node mass production by defining the spectrum and its requirements for lithography performance.

Proceedings Article | 24 March 2017 Paper

Excimer laser gas usage reduction technology for semiconductor manufacturing

Masanori Yashiro, Takuma Oouchi, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 101471O (2017) https://doi.org/10.1117/12.2257972

KEYWORDS: Gas lasers, Excimer lasers, Neon, Semiconductor manufacturing, Lithography, Beam controllers, Xenon, Deep ultraviolet, Light sources, Molecules, Laser systems engineering, Sustainable technology, Prototyping, Pulsed laser operation, Laser stabilization

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Proceedings Article | 24 March 2017 Paper

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Hiroshi Furusato, Takahito Kumazaki, Takeshi Ohta, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 101471N (2017) https://doi.org/10.1117/12.2257960

KEYWORDS: Helium, Actuators, Optical lithography, Excimer lasers, Immersion lithography, Yield improvement, Wavefronts, Critical dimension metrology, Refractive index, Nitrogen, Thermal effects, Diffraction gratings, Control systems

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Proceedings Article | 24 March 2017 Presentation + Paper

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 1014719 (2017) https://doi.org/10.1117/12.2257959

KEYWORDS: Neon, Helium, Gases, Image processing, Nitrogen, Immersion lithography, Gas lasers, Image contrast enhancement, Image enhancement, Excimer lasers, Actuators, Wavefronts, Refractive index, Semiconducting wafers, Critical dimension metrology

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. The most needed features for the next generation lasers are improvement of device yield, the prevention against rare resource shortage and the reduction of operational costs in multiple-patterning lithography [1] [2]. To support these requirements, GT65A provides the functions of tighter E95 bandwidth stability, lower E95 bandwidth and tunable E95 bandwidth to enhance chip yields [3] [4]. Furthermore, in the prevention against rare resource shortage and the reduction of operational costs, GT65A realizes helium-free operation in a line narrowing module (LNM) and the reduction of neon consumption in a chamber [5]. A faster actuator equipped with the movable lens enables shot average of E95 bandwidth stability to be within ±5 fm to more rapidly adjust laser beam wavefront. More stable spectral bandwidth stability leads to improve CD uniformity. New designed LNM realizes 200 fm of lower E95 bandwidth, because it suppresses thermal wavefront deformation in optical elements and mechanical components. Lower E95 bandwidth improves image contrast and enhances exposure latitude. The combination of a faster actuator and new LNM enables tunable E95 bandwidth to vary from 200 to 450 fm at less than time intervals of a wafer lot exchange, six seconds. This enhances imaging margins by optimizing E95 bandwidth of light sources according to individual scanners. New LNM additionally enables helium-free operation to lower E95 bandwidth in spite of nitrogen purge with higher refractive index variation to temperature. The employment of a new LNM can avoid helium supply risk and saves helium consumption of 80 kL/year/unit. Gas recycling system saves by about 92% of neon consumption in ArF laser. Similarly, the recycling system saves about 85% of neon consumption in KrF laser too. These functions with GT65A improve chip yield and process margins, and support sustainable high volume manufacturing (HVM).

Proceedings Article | 22 February 2017 Presentation + Paper

193nm high power lasers for the wide bandgap material processing

Junichi Fujimoto, Masakazu Kobayashi, Koji Kakizaki, Hiroaki Oizumi, Toshio Mimura, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10097, 100970T (2017) https://doi.org/10.1117/12.2250706

KEYWORDS: Excimer lasers, Deep ultraviolet, Materials processing, High power lasers, Laser processing, Solid state lasers, Semiconductor manufacturing, Reliability, Annealing, Glasses, Laser ablation, Scanning electron microscopy, Infrared lasers, Micromachining, Copper

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Proceedings Article | 9 November 2016 Paper

High power DUV lasers for material processing

Toshio Mimura, Kouji Kakizaki, Hiroaki Oizumi, Masakazu Kobayashi, Junichi Fujimoto, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10016, 1001603 (2016) https://doi.org/10.1117/12.2247870

KEYWORDS: Excimer lasers, Laser processing, Deep ultraviolet, Materials processing, High power lasers, Solid state lasers, Heat treatments, Glasses, Pulsed laser operation, Laser bonding

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Proceedings Article | 15 March 2016 Paper

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9780, 97801I (2016) https://doi.org/10.1117/12.2218778

KEYWORDS: Helium, Lithography, Excimer lasers, Immersion lithography, Optical lithography, Refractive index, Nitrogen, Wavefronts, Algorithm development, Deep ultraviolet, Diffraction gratings, Thermal effects, Optical components

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Proceedings Article | 15 March 2016 Paper

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Keisuke Ishida, Takeshi Ohta, Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9780, 978010 (2016) https://doi.org/10.1117/12.2219379

KEYWORDS: Helium, Neon, Control systems, Laser development, Optical components, Immersion lithography, Excimer lasers, Optical lithography, Lithography, Gas lasers, Actuators, Semiconducting wafers, Laser applications

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Proceedings Article | 18 March 2015 Paper

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takeshi Ohta, Keisuke Ishida, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261J (2015) https://doi.org/10.1117/12.2085631

KEYWORDS: Semiconducting wafers, Algorithm development, Lithography, Control systems, Laser development, Optical components, Laser stabilization, Gases, Helium, Immersion lithography

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Proceedings Article | 18 March 2015 Paper

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Takeshi Ohta, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261A (2015) https://doi.org/10.1117/12.2085006

KEYWORDS: Helium, Gas lasers, Lithography, Neon, Laser development, Semiconducting wafers, Laser applications, Light sources, Gases, Extreme ultraviolet lithography

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Proceedings Article | 4 April 2014 Paper

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Hiroaki Tsushima, Hisakazu Katsuumi, Hiroyuki Ikeda, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90521E (2014) https://doi.org/10.1117/12.2046189

KEYWORDS: Excimer lasers, Electrodes, 193nm lithography, Lithography, Laser applications, Light sources, Semiconducting wafers, Neodymium, Optical lithography, Semiconductors

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Proceedings Article | 31 March 2014 Paper

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90522E (2014) https://doi.org/10.1117/12.2046128

KEYWORDS: Light sources, Semiconducting wafers, Beam propagation method, Sensors, Polarization, Data acquisition, Lithography, Infrared sensors, Metrology, Liquid crystal lasers

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Proceedings Article | 12 April 2013 Paper

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima, Akihiko Kurosu, Hiroaki Tsushima, Takahito Kumazaki, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 8683, 86831G (2013) https://doi.org/10.1117/12.2011404

KEYWORDS: Excimer lasers, Lithography, Light sources, 193nm lithography, Semiconducting wafers, Laser stabilization, Laser systems engineering, Pulsed laser operation, High power lasers, Extreme ultraviolet

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Proceedings Article | 13 March 2012 Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

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Proceedings Article | 23 March 2011 Paper

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Masaya Yoshino, Shinich Matsumoto, Hiroshi Tanaka, Akihiko Kurosu, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7973, 79731K (2011) https://doi.org/10.1117/12.879205

KEYWORDS: Reliability, Excimer lasers, Ecology, Immersion lithography, Double patterning technology, Laser development, Lithography, Laser applications, Light sources, High power lasers

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Proceedings Article | 10 March 2010 Paper

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Masaya Yoshino, Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Shinich Matsumoto, Takashi Onose, Hiroyuki Nogawa, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7640, 76402A (2010) https://doi.org/10.1117/12.846337

KEYWORDS: Reliability, Double patterning technology, Excimer lasers, High power lasers, Immersion lithography, Lithography, Pulsed laser operation, Laser stabilization, Laser applications, Laser development

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Proceedings Article | 16 March 2009 Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 16 March 2009 Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

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Proceedings Article | 26 March 2007 Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 15 March 2006 Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

High-power injection lock laser platform for ArF dry/wet lithography

H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Ohta, M. Nakane, M. Moriya, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, T. Ito, H. Umeda, S. Tanaka, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, N. Matsui, T. Mimura, K. Kakizaki, M. Goto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

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Proceedings Article | 28 May 2004 Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 26 June 2003 Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 14 September 2001 Paper

Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Takashi Saito, Takashi Matsunaga, Ken-ichi Mitsuhashi, Katsutomo Terashima, Takeshi Ohta, Akifumi Tada, Takanobu Ishihara, Masaya Yoshino, Hiroaki Tsushima, Tatsuo Enami, Hitoshi Tomaru, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435658

KEYWORDS: Surface plasmons, Photovoltaics, Excimer lasers, Lithography, Optical lithography, Pulsed laser operation, Laser development, Laser scanners, 3D scanning, Performance modeling

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Proceedings Article | 14 September 2001 Paper

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

Kouji Kakizaki, Takashi Matsunaga, Yoichi Sasaki, Toyoharu Inoue, Satoshi Tanaka, Akifumi Tada, Hiroaki Taniguchi, Motohiro Arai, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435656

KEYWORDS: Excimer lasers, Argon, Lithography, Electrodes, Pulsed laser operation, Laser development, Laser stabilization, Gas lasers, Laser scanners, 3D scanning

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Proceedings Article | 14 September 2001 Paper

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Takashi Matsunaga, Tatsuo Enami, Kouji Kakizaki, Takashi Saito, Satoshi Tanaka, Hiroaki Nakarai, Toyoharu Inoue, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435703

KEYWORDS: Excimer lasers, Electrodes, Laser scanners, Lithography, 3D scanning, Chromium, Laser development, Pulsed laser operation, Light sources, Molecules

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Showing 5 of 29 publications

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