Mr. Tamotsu Abe Profile

Tamotsu Abe

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (59)

Proceedings Article | 12 November 2024 Poster + Paper

Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Atsushi Ueda, Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 13215, 132150X (2024) https://doi.org/10.1117/12.3034058

KEYWORDS: Extreme ultraviolet, Light sources, Tin, Collector mirrors, Plasma, Plasma generation, Reflectivity, Laser irradiation

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Proceedings Article | 10 April 2024 Poster + Paper

Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito

Proceedings Volume 12953, 1295313 (2024) https://doi.org/10.1117/12.3010135

KEYWORDS: Extreme ultraviolet, Tin, Light sources, Inspection, Plasma, Collector mirrors, Plasma generation, Control systems, Laser irradiation, Reliability

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Proceedings Article | 21 November 2023 Poster + Paper

Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 12750, 127500V (2023) https://doi.org/10.1117/12.2686618

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Laser irradiation, Collector mirrors, Tin, Laser applications, Semiconductors, Reliability, Plasma

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Proceedings Article | 28 April 2023 Poster + Paper

Development progress of key components for LPP-EUV light sources

Hiroaki Tomuro, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 12494, 1249411 (2023) https://doi.org/10.1117/12.2657640

KEYWORDS: Extreme ultraviolet, Tin, Collector mirrors, Laser irradiation, Light sources, Plasma, Ions, Gas lasers, Hydrogen, Control systems

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Key technology development progress of the high power LPP-EUV light source

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 12051, 120510T (2022) https://doi.org/10.1117/12.2612778

KEYWORDS: Extreme ultraviolet, Tin, Control systems, Light sources, Plasma, Pulsed laser operation, Ions

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Proceedings Article | 13 October 2021 Presentation + Paper

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11854, 118540K (2021) https://doi.org/10.1117/12.2600714

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Plasma, Laser systems engineering, Extreme ultraviolet lithography, Light sources, Reflectivity, Laser development

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Proceedings Article | 23 February 2021 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long mirror lifetime-III for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanak, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, George Sumangne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11609, 1160919 (2021) https://doi.org/10.1117/12.2581910

KEYWORDS: Mirrors, Semiconductors, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Magnetism, Light sources, Tin, Reflectivity

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

The development progress of the high power LPP-EUV light source using a magnetic field

Hirokazu Hosoda, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Yoshifumi Ueno, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 11609, 116091G (2021) https://doi.org/10.1117/12.2582855

KEYWORDS: Light sources, Tin, Magnetism, Extreme ultraviolet, Mirrors, Ions, Reflectivity, Sputter deposition, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 21 September 2020 Poster + Presentation

Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 11517, 1151717 (2020) https://doi.org/10.1117/12.2572689

KEYWORDS: Tin, Light sources, Mirrors, Magnetism, Extreme ultraviolet, Carbon dioxide lasers, Hydrogen, Chemical species, Pulsed laser operation, Reflectivity

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Proceedings Article | 20 September 2020 Presentation

Update of >300W high power LPP-EUV source challenge for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Yoshifumi Ueno, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou, Hirokazu Hosoda, Hiroaki Tomuro, Shinji Nagai, Gouta Niimi, Takashi Suganuma

Proceedings Volume 11517, 115170Q (2020) https://doi.org/10.1117/12.2574707

KEYWORDS: Mirrors, Semiconductors, Extreme ultraviolet, Carbon dioxide lasers, Extreme ultraviolet lithography, Light sources, Magnetism, Magnetic semiconductors, Tin, Pulsed laser operation

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Proceedings Article | 23 March 2020 Paper

Update of development progress of the high power LPP-EUV light source using a magnetic field

Gouta Niimi, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11323, 1132328 (2020) https://doi.org/10.1117/12.2544051

KEYWORDS: Gas lasers, Carbon monoxide, Extreme ultraviolet, Tin, Mirrors, Magnetism, Plasma, Light sources, Control systems, Pulsed laser operation

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Proceedings Article | 23 March 2020 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11323, 113230X (2020) https://doi.org/10.1117/12.2549905

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Mirrors, Tin, Plasma, Light sources, Extreme ultraviolet lithography, Reflectivity, Magnetism, Laser development

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Proceedings Article | 26 September 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Yuta Takashima, Yoshifumi Ueno, Takayuki Yabu, Tsukasa Hori, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11147, 111471M (2019) https://doi.org/10.1117/12.2536397

KEYWORDS: Extreme ultraviolet, Light sources

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Proceedings Article | 26 September 2019 Presentation + Paper

Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11147, 1114705 (2019) https://doi.org/10.1117/12.2534147

KEYWORDS: Mirrors, Semiconductors, Reflectivity

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Proceedings Article | 6 June 2019 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10957, 1095716 (2019) https://doi.org/10.1117/12.2514033

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Mirrors, Tin, Plasma, Light sources, Laser development, Ions, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 26 March 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10957, 109571S (2019) https://doi.org/10.1117/12.2514809

KEYWORDS: Tin, Gas lasers, Extreme ultraviolet, Magnetism, Carbon monoxide, Mirrors, Plasma, Light sources, Pulsed laser operation, Semiconductors

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Proceedings Article | 12 October 2018 Presentation

Long collector mirror lifetime demonstration around 100W average LP-EUV source for semiconductor high volume manufacturing (Conference Presentation)

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodema, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10809, 1080906 (2018) https://doi.org/10.1117/12.2502015

KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

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Proceedings Article | 3 October 2018 Paper

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356

KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

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Proceedings Article | 19 March 2018 Paper

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10583, 1058328 (2018) https://doi.org/10.1117/12.2283066

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

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Proceedings Article | 19 March 2018 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamatsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10583, 1058318 (2018) https://doi.org/10.1117/12.2299300

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2017 Paper

Key components development progress updates of the 250W high power LPP-EUV light source

Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10450, 104501C (2017) https://doi.org/10.1117/12.2280503

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

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Proceedings Article | 16 October 2017 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10450, 104500Z (2017) https://doi.org/10.1117/12.2281129

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

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Proceedings Article | 24 March 2017 Paper

Key components technology update of the 250W high-power LPP-EUV light source

Yasufumi Kawasuji, Krzysztof Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

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Proceedings Article | 22 February 2017 Open Access

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

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Proceedings Article | 18 March 2016 Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

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Proceedings Article | 18 March 2016 Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tamotsu Abe, Takeshi Okamoto, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

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Proceedings Article | 13 March 2015 Paper

Performance of one hundred watt HVM LPP-EUV source

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 13 March 2015 Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

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Proceedings Article | 17 April 2014 Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

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Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

LPP-EUV light source development for high volume manufacturing lithography

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

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SPIE Journal Paper | 29 May 2012

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Junichi Fujimoto, Hakaru Mizoguchi, Tamotsu Abe, Satoshi Tanaka, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hiroaki Nakarai

JM3, Vol. 11, Issue 02, 021111, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021111

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Carbon monoxide, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Magnetism, Ions, Laser applications

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Proceedings Article | 23 March 2012 Paper

Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida, Takeshi Ohta, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Hakaru Mizoguchi

Proceedings Volume 8322, 83220F (2012) https://doi.org/10.1117/12.916093

KEYWORDS: Carbon dioxide lasers, Tin, Extreme ultraviolet, Light sources, Magnetism, Plasma, Extreme ultraviolet lithography, Chemical species, Ions, Pulsed laser operation

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Proceedings Article | 7 April 2011 Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

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Proceedings Article | 23 March 2010 Paper

Present status of laser-produced plasma EUV light source

Hitoshi Nagano, Tamotsu Abe, Shinji Nagai, Masaki Nakano, Yoshihiko Akanuma, Shin Nakajima, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7636, 76363C (2010) https://doi.org/10.1117/12.846273

KEYWORDS: Tin, Ions, Magnetism, Extreme ultraviolet, Etching, Plasma, Mirrors, Gases, Carbon dioxide lasers, Light sources

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Proceedings Article | 20 March 2010 Paper

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Proceedings Volume 7636, 763608 (2010) https://doi.org/10.1117/12.846271

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Tin, Laser systems engineering, Plasma systems, Mirrors, Extreme ultraviolet lithography, Pulsed laser operation

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Proceedings Article | 18 March 2009 Paper

Evaluation at the intermediate focus for EUV light source

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo

Proceedings Volume 7271, 727133 (2009) https://doi.org/10.1117/12.813494

KEYWORDS: Extreme ultraviolet, Mirrors, Carbon dioxide lasers, Light sources, Plasma, Tin, Optical filters, Extreme ultraviolet lithography, Reflectivity, Optical filtering

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 12 May 2008 Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 7005, 70052U (2008) https://doi.org/10.1117/12.782475

KEYWORDS: Tin, Magnetism, Plasma, Ions, Carbon dioxide lasers, Mirrors, Extreme ultraviolet, Light sources, Carbon dioxide, Nd:YAG lasers

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Proceedings Article | 21 March 2008 Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 69212Z (2008) https://doi.org/10.1117/12.771817

KEYWORDS: Tin, Plasma, Magnetism, Carbon dioxide lasers, Ions, Mirrors, Silicon, Extreme ultraviolet, Gold, Statistical analysis

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Proceedings Article | 21 March 2008 Paper

LPP EUV light source employing high power C02 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692131 (2008) https://doi.org/10.1117/12.771847

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Light sources, Oscillators, Tin, Carbon dioxide, Laser stabilization

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Proceedings Article | 21 March 2008 Paper

Sn droplet target development for laser produced plasma EUV light source

Masaki Nakano, Takayuki Yabu, Hiroshi Someya, Tamotsu Abe, Georg Soumagne, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692130 (2008) https://doi.org/10.1117/12.771820

KEYWORDS: Tin, Extreme ultraviolet, Electrodes, Laser development, Plasma, Light sources, Laser irradiation, Chemical species, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 20 March 2008 Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 13 September 2007 Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6703, 670309 (2007) https://doi.org/10.1117/12.732254

KEYWORDS: Gas lasers, Tin, Carbon monoxide, Extreme ultraviolet, Plasma, Pulsed laser operation, Carbon dioxide lasers, Light sources, Magnetism, Ions

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Proceedings Article | 21 March 2007 Paper

Small field exposure tool (SFET) light source

Tamotsu Abe, Takashi Suganuma, Masato Moriya, Takayuki Yabu, Takeshi Asayama, Hiroshi Someya, Yoshifumi Ueno, Georg Soumagne, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6517, 65173C (2007) https://doi.org/10.1117/12.711241

KEYWORDS: Plasma, Xenon, Light sources, Extreme ultraviolet, Mirrors, Optical filters, Actuators, Laser development, Extreme ultraviolet lithography, High power lasers

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Proceedings Article | 24 March 2006 Paper

KrF laser driven xenon plasma light source of a small-field exposure tool

Tamotsu Abe, Masato Moriya, Hiroshi Someya, Georg Soumagne, Takashi Suganuma, Takayuki Watanabe, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6151, 61513T (2006) https://doi.org/10.1117/12.656228

KEYWORDS: Light sources, Xenon, Plasma, Extreme ultraviolet lithography, Laser development, Mirrors, Lithography, Optical filters, Pulsed laser operation, Liquids

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Proceedings Article | 23 March 2006 Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 6 May 2005 Paper

Magnetic field ion mitigation for EUV light sources

Hiroshi Komori, Yousuke Imai, Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Akira Endo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600360

KEYWORDS: Ions, Magnetism, Xenon, Plasma, Extreme ultraviolet, Mirrors, Light sources, Pulsed laser operation, Laser energy, Nd:YAG lasers

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Proceedings Article | 6 May 2005 Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 3 November 2004 Paper

High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma

Masaki Nakano, Tamotsu Abe, Akira Endo

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.555468

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Light sources, Extreme ultraviolet lithography, Liquids, Lithography, Nd:YAG lasers, Oscillators, Amplifiers

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Proceedings Article | 8 October 2004 Paper

Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography

Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Yuichi Takabayashi, Akira Endo

Proceedings Volume 5662, (2004) https://doi.org/10.1117/12.596356

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Liquids, Pulsed laser operation, Nd:YAG lasers, Mirrors, Plasma systems

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Proceedings Article | 20 September 2004 Paper

Measurements of energy distribution functions of xenon ions from laser-produced plasmas for lithography

Georg Soumagne, Tamotsu Abe, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Akira Endo

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.545933

KEYWORDS: Ions, Xenon, Plasmas, Mirrors, Picosecond phenomena, Microchannel plates, Pulsed laser operation, Reflectivity, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 10 June 2004 Paper

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5482, (2004) https://doi.org/10.1117/12.558598

KEYWORDS: Plasmas, Picosecond phenomena, Pulsed laser operation, Aluminum, Extreme ultraviolet, Tin, Copper, X-ray sources, Spectrographs, Tungsten

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Proceedings Article | 20 May 2004 Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 20 May 2004 Paper

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Akira Endo, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534060

KEYWORDS: Ions, Xenon, Plasmas, Magnetism, Mirrors, Extreme ultraviolet, Reflectivity, Microchannel plates, Light sources, Surface roughness

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Proceedings Article | 7 January 2004 Paper

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.503434

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Ions, Liquids, Absorption, Mirrors, Light sources, Data modeling, Pulsed laser operation

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Proceedings Article | 18 November 2003 Paper

EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.541149

KEYWORDS: Plasma, Picosecond phenomena, Aluminum, Tin, Copper, Pulsed laser operation, Extreme ultraviolet, Solids, Light sources, Laser energy

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Proceedings Article | 16 June 2003 Paper

Development of a liquid-jet laser-produced plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Yukihiko Sugimoto, Hiroshi Someya, Hideo Hoshino, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483598

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Extreme ultraviolet lithography, Plasma, Laser systems engineering, Oscillators, Liquids, Amplifiers, Temperature metrology

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Proceedings Article | 16 May 2003 Paper

Fluctuation of laser-induced x-rays from electron beam and plasma

Akira Endo

Proceedings Volume 5111, (2003) https://doi.org/10.1117/12.498880

KEYWORDS: Extreme ultraviolet, X-rays, Plasma, Xenon, Pulsed laser operation, Electron beams, Laser scattering, Liquids, Femtosecond phenomena, X-ray lasers

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There has been a significant progress in the X-ray generation technologies for various laboratory and production application by laser-Compton scheme and laser produced plasma. Femtosecond X-ray generation was performed by Compton scattering through interaction between a 3-ps electron beam and 100-fs laser photons in a 90 degree scattering configuration. The X-ray energy and pulse duration were estimated as 2.3keV and 280fs from the observed electron and laser beam parameters. The fluctuation of the X-ray output was measured as 25% rms during a 30-min operation, and analyzed as a function of fluctuations of parameters like timing between the electron and laser beam, electron beam charge, laser beam energy, pulse widths, and spatial stability. Further reduction of the fluctuation is possible by improvement of timing stability down to 100fs region. All optical synchronization scheme was proposed and component technologies are under development. The novel scheme employs optical control of linear accelerator and femtosecond lasers by optical locking of lasing between different laser oscillators. Two mode-locked Ti:sapphire lasers of different wavelengths were precisely synchronized by a simple feedback system employing sum frequency generation. The measured rms timing jitter between two lasers was 28fs. Clean EUV light source is strongly demanded for next generation lithography, with 13.5nm, 2%bw, 100W and high pulse stability of less than 1%. The most promising approach is to employ a liquid Xe jet of 10-30 micron-meter diameter as the plasma source with high repetition rate solid state laser. The laser pulse energy usually fluctuates more than a few % and liquid jet fluctuates of the position up to 10% of the diameter. Higher repetition rate plasma generation causes acoustic instability inside the liquid jet. All these obstacles prevent to achieve the desired EUV stability. Discussion will be given on these issues and new architecture is proposed to achieve a clean and stable EUV light source.

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