Mr. Teruhiko Kumada Profile

Teruhiko Kumada

at Mitsubishi Electric Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 1 April 2009 Paper

Defect reduction in non-topcoat resist by selective segregation removal step

Takuya Hagiwara, Mamoru Terai, Takeo Ishibashi, Tomofumi Miyauchi, Shinya Hori, Teruhiko Kumada, Tomoya Kumagai, Atsushi Sawano, Kosuke Doi, Takeshi Matsunobe, Naoki Man, Hirofumi Seki, Yusaku Tanahashi, Tetsuro Hanawa

Proceedings Volume 7273, 727324 (2009) https://doi.org/10.1117/12.813643

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

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Proceedings Article | 26 March 2008 Paper

Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography

Takeo Ishibash, Mamoru Terai, Takuya Hagiwara, Teruhiko Kumada, Tetsuro Hanawa, Yoko Takebe, Osamu Yokokoji, Tomoharu Fujiwara, Hiroshi Akiyama

Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794

KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

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Proceedings Article | 7 March 2008 Paper

Double patterning using dual spin-on Si containing layers with multilayer hard mask process

Mamoru Terai, Takeo Ishibashi, Masaaki Shinohara, Kazumasa Yonekura, Takuya Hagiwara, Tetsuro Hanawa, Teruhiko Kumada

Proceedings Volume 6924, 692420 (2008) https://doi.org/10.1117/12.771855

KEYWORDS: Etching, Double patterning technology, Silicon, Optical lithography, Coating, Photomasks, FT-IR spectroscopy, Photoresist processing, Silica, Scanning electron microscopy

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Proceedings Article | 2 April 2007 Paper

Mechanism of immersion specific defects with high receding-angle topcoat

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Takuya Hagiwara, Tetsuro Hanawa, Tomoyuki Ando, Takeshi Matsunobe, Kazuyuki Okada, Yuichi Muraji, Kazuhiro Yoshikawa, Naoki Man

Proceedings Volume 6519, 65191S (2007) https://doi.org/10.1117/12.711058

KEYWORDS: Water, Bridges, Immersion lithography, Semiconducting wafers, Digital watermarking, Surface properties, Polymers, Chemical analysis, Defect inspection, Standards development

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Proceedings Article | 11 April 2006 Paper

Studies on immersion defects using mimic immersion experiments

Tetsuro Hanawa, Toshifumi Suganaga, Takeo Ishibashi, Shinroku Maejima, Koichiro Narimatsu, Kazuyuki Suko, Mamoru Terai, Teruhiko Kumada, Junichi Kitano

Proceedings Volume 6153, 61531O (2006) https://doi.org/10.1117/12.655568

KEYWORDS: Thin film coatings, Immersion lithography, Lithography, Semiconducting wafers, Scanners, Photoresist processing, Contamination, Defect inspection, Chemical analysis, Absorption

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Proceedings Article | 29 March 2006 Paper

Newly developed RELACS materials and process for 65 nm nodes

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Tetsuro Hanawa, Noboru Satake, Yusuke Takano

Proceedings Volume 6153, 61532I (2006) https://doi.org/10.1117/12.651242

KEYWORDS: Semiconducting wafers, Lithography, Etching, Photoresist processing, Polymers, Materials processing, Resolution enhancement technologies, Resistance, Optical lithography, Photomasks

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Proceedings Article | 29 March 2006 Paper

Studies of the mechanism for immersion specific defects

Takeo Ishibashi, Tetsuro Hanawa, Toshifumi Suganaga, Koichiro Narimatsu, Kazuyuki Suko, Mamoru Terai, Teruhiko Kumada, Tomoyuki Ando

Proceedings Volume 6153, 61533I (2006) https://doi.org/10.1117/12.654756

KEYWORDS: Ions, Semiconducting wafers, Chemical analysis, Statistical analysis, Immersion lithography, Technetium, Contamination, Photoresist processing, Adsorption, Neodymium

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Proceedings Article | 28 August 2003 Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat II

Teruhiko Kumada, Koji Tange, Kazuyuki Maetoko, Kunihiro Hosono, Masayoshi Tsuzuki, Kyoichi Yonetani, Reiji Terada, Yukio Nakashiba, Shingo Anzai, Yasutaka Kikuchi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504182

KEYWORDS: Critical dimension metrology, Photomasks, Chemically amplified resists, Manufacturing, Polymers, Photoresist processing, Coating, Diffusion, Semiconducting wafers, Molecules

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Proceedings Article | 1 August 2002 Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat

Teruhiko Kumada, Atsuko Sasahara, Kazuyuki Maetoko, Kunihiro Hosono, Takemichi Honma, Yuji Kodaira, Yukio Nakashiba, Masaoshi Tsuzuki, Yasutaka Kikuchi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476955

KEYWORDS: Critical dimension metrology, Photomasks, Chemically amplified resists, Manufacturing, Photoresist processing, Polymers, Inspection, Coating, Printing, Diffusion

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Proceedings Article | 21 July 2000 Paper

Stress relaxation of EB resist for x-ray mask fabrication

Atsuko Sasahara, Teruhiko Kumada, Koji Kise, Hiroaki Sumitani

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390046

KEYWORDS: X-rays, Coating, Deep ultraviolet, Ultraviolet radiation, Photomasks, Absorption, Polymers, Mask making, X-ray imaging, Semiconducting wafers

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Proceedings Article | 29 June 1998 Paper

Influence of salting-out effect in ArF resist development

Yasuhiro Yoshida, Teruhiko Kumada, Atsuko Sasahara, Atsushi Oshida, Hiroshi Adachi

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312464

KEYWORDS: Polymers, Ions, Molecules, Diffusion, Transparency, Lithography, Semiconducting wafers, Chlorine, Photoresist processing, Silicon

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Proceedings Article | 7 July 1997 Paper

High-contrast chemically amplified resist for SR lithography

Teruhiko Kumada, Hiroshi Adachi, Hiroshi Watanabe, Hiroaki Sumitani

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275846

KEYWORDS: X-rays, Lithography, Chemically amplified resists, Photomasks, Chemical reactions, X-ray lithography, X-ray technology, Transparency, Signal attenuation, Electron beams

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Proceedings Article | 9 June 1995 Paper

Effect of dissolution inhibitors on the dissolution characteristics of chemically amplified positive-tone electron beam resist

Hideo Horibe, Teruhiko Kumada, Shigeru Kubota, Yoshika Kimura

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210362

KEYWORDS: Electron beams, Absorption, Lithography, Deep ultraviolet, Polymers, Thin film coatings, Infrared spectroscopy, Scanning electron microscopy, Photography, Industrial chemicals

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Proceedings Article | 15 September 1993 Paper

Study on the over-top-coating suppressing surface insoluble layer generation for chemical amplification resist

Teruhiko Kumada, Youko Tanaka, Akemi Ueyama, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa, Hiroaki Morimoto

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154764

KEYWORDS: Coating, Polymers, Natural surfaces, Diffusion, Excimer lasers, Water, Chemical species, Photoresist processing, X-rays, Photoemission spectroscopy

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Showing 5 of 14 publications

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