Dr. Thomas Missalla Profile

Dr. Thomas Missalla

Research & Development EUV at JENOPTIK Optical Systems GmbH

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Author

Publications (6)

Proceedings Article | 20 May 2004 Paper

Metrology tools for EUV-source characterization and optimization

Thomas Missalla, Max Schuermann, Rainer Lebert, Christian Wies, Larissa Juschkin, Roman Klein, Frank Scholze, Gerhard Ulm, Andre Egbert, Boris Tkachenko, Boris Chichkov

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.556521

KEYWORDS: Calibration, Extreme ultraviolet, Sensors, Diodes, Metrology, Spectrographs, Optical filters, Extreme ultraviolet lithography, Transmittance, Mirrors

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Proceedings Article | 20 May 2004 Paper

Status of EUV-lamp development and demonstration of applications

Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen, Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier, Max Schuermann, Thomas Missalla

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538058

KEYWORDS: Extreme ultraviolet, Lamps, Extreme ultraviolet lithography, Calibration, Mirrors, Silicon, Reflectometry, Metrology, Neon, Zirconium

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Proceedings Article | 16 June 2003 Paper

Spatial emission characteristics of EUV plasma sources

Klaus Mann, Sebastian Kranzusch, Christian Peth, Max Schurmann, Thomas Missalla

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482748

KEYWORDS: Extreme ultraviolet, Plasma, Coded apertures, Laser induced fluorescence, Xenon, Gas lasers, Luminescence, Visualization, Absorption, Laser development

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Proceedings Article | 16 June 2003 Paper

Metrology tools for EUVL-source characterization and optimization

Max Schuermann, Thomas Missalla, Klaus Mann, Sebastian Kranzusch, Roman Klein, Frank Scholze, Gerhard Ulm, Rainer Lebert, Larissa Juschkin

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482667

KEYWORDS: Calibration, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Plasma, Metrology, Optical filters, Spectrographs, Photodiodes, Multilayers

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Proceedings Article | 16 June 2003 Paper

Compact electron-based extreme-ultraviolet source at 13.5 nm

Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Boris Chichkov, Thomas Missalla, Max Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482366

KEYWORDS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Molybdenum, Metrology, Spectrographs, Titanium

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SPIE Journal Paper | 1 April 2003

Compact electron-based extreme ultraviolet source at 13.5 nm

Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Carsten Fallnich, Boris Chichkov, Thomas Miflalla, Max Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1532350

KEYWORDS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Metrology, X-rays, X-ray technology, Extreme ultraviolet lithography

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Showing 5 of 6 publications

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