Mr. Todd Lukanc Profile

Todd Lukanc

Manager OPC Group at Intel Corp

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Author

Publications (6)

Proceedings Article | 8 October 2014 Paper

Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

Robert Pack, Keith Standiford, Todd Lukanc, Guo Xiang Ning, Piyush Verma, Fadi Batarseh, Gek Soon Chua, Akira Fujimura, Linyong Pang

Proceedings Volume 9235, 923509 (2014) https://doi.org/10.1117/12.2069613

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Vestigial sideband modulation, Semiconducting wafers, Data modeling, Model-based design, Error analysis, Manufacturing, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

Challenges for the quality control of assist features for 45nm node technology and beyond

Lin Wang, Todd Lukanc, Makoto Takahashi, Hung-Eil Kim, Khoi Phan, Taichi Yamazaki, Yosuke Kojima, Wataru Nozaki, Takashi Haraguchi, Yoshimitsu Okuda

Proceedings Volume 7122, 71220Z (2008) https://doi.org/10.1117/12.800916

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Optical proximity correction, Line edge roughness, Chromium, Photoresist processing, Resolution enhancement technologies, Reticles, SRAF

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Proceedings Article | 1 April 2008 Paper

Advanced OPC and 2D verification for tip engineering using aggressive illuminations

X. Zhang, T. Lukanc, H. Yang, B. Ward

Proceedings Volume 6924, 69241H (2008) https://doi.org/10.1117/12.773021

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Illumination engineering, Resolution enhancement technologies, Bridges, Printing, Aberration correction, Semiconducting wafers, Algorithm development, Manufacturing

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Proceedings Article | 7 March 2008 Paper

Understanding and application of constructive, destructive SRAF

Fook Chin, Todd Lukanc

Proceedings Volume 6924, 69242V (2008) https://doi.org/10.1117/12.773049

KEYWORDS: SRAF, Image processing, Lithography, Optical lithography, Photomasks, Atrial fibrillation, Error analysis, Manufacturing, Optical proximity correction, Electroluminescence

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Proceedings Article | 12 May 2005 Paper

Design restrictions for patterning with off-axis illumination

Itty Matthew, Cyrus Tabery, Todd Lukanc, Marina Plat, Makoto Takahashi, Amada Wilkison

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606444

KEYWORDS: Cadmium sulfide, Optical lithography, Optical proximity correction, Diffraction, Transistors, Critical dimension metrology, Lithography, Photomasks, Resolution enhancement technologies, Lithographic illumination

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Proceedings Article | 18 August 2000 Paper

Novel electrical alignment structure

Todd Lukanc

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395717

KEYWORDS: Optical alignment, Resistors, Overlay metrology, Printing, Critical dimension metrology, Databases, Yield improvement, Failure analysis, Manufacturing, Optical lithography

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Showing 5 of 6 publications

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