Dr. Tony D. Flaim Profile

Dr. Tony D. Flaim

Chief Technical Officer at Brewer Science Inc

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 4 April 2005 Paper

Hybrid high refractive index polymer coatings

Douglas Holmes, Shelly Fowler, Ramil Mercado, Curtis Planje, Yubao Wang, Tony Flaim

Proceedings Volume 5724, (2005) https://doi.org/10.1117/12.589149

KEYWORDS: Refractive index, Polymers, Titanium, Photorefractive polymers, Optical coatings, Polymer thin films, Metals, Oxides, Transparency, Titanium dioxide

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Proceedings Article | 4 April 2005 Paper

High refractive index photocurable resins

Robert Morford, Tony Flaim, Curtis Planje, Ramil Mercado

Proceedings Volume 5724, (2005) https://doi.org/10.1117/12.590578

KEYWORDS: Refractive index, Semiconducting wafers, Quartz, Ultraviolet radiation, Visible radiation, Silicon, Prisms, Coating, Transparency, Optoelectronic devices

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Proceedings Article | 18 June 2004 Paper

Thin-film polyetherimides with controlled refractive indices

Yubao Wang, William DiMenna, Ramil Mercado, Tony Flaim, Udayan Senapati

Proceedings Volume 5351, (2004) https://doi.org/10.1117/12.529576

KEYWORDS: Refractive index, Polymers, Photorefractive polymers, Optical coatings, Transparency, Glasses, Visible radiation, Thin films, Refraction, Light emitting diodes

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Proceedings Article | 25 February 2004 Paper

High-refractive-index polymer coatings for optoelectronics applications

Yubao Wang, Ramil Mercado, Tony Flaim

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.513363

KEYWORDS: Refractive index, Optical coatings, Polymers, Oxides, Metals, Photorefractive polymers, Thin film coatings, Transmittance, Sol-gels, Titanium dioxide

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Proceedings Article | 30 December 2003 Paper

Polymeric protective coatings for MEMS wet-etch processes

Kimberly Ruben, Chenghong Li, Tony Flaim

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.523965

KEYWORDS: Etching, Silicon, Polymers, Manufacturing, Semiconducting wafers, Microelectromechanical systems, Bulk micromachining, Electronic circuits, Potassium, Resistance

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Proceedings Article | 12 June 2003 Paper

193-nm multilayer imaging systems

Tony Flaim, Ichiro Kobayashi, Mariya Nagatkina, James Meador, Doug Holmes, Michael Rich, Randy Bennett, William DiMenna

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485082

KEYWORDS: Etching, Photoresist materials, Reflectivity, Polymers, Plasma etching, Electroluminescence, Silicon, Optical coatings, Scanning electron microscopy, Multilayers

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Proceedings Article | 16 May 2003 Paper

Dyed red, green, and blue photoresist for manufacture of high-resolution color filter arrays for image sensors

Sam Sun, Tony Flaim, Douglas Guerrero, William DiMenna, Ramil Mercado

Proceedings Volume 5017, (2003) https://doi.org/10.1117/12.476750

KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Optical filters, Electroluminescence, Polymethylmethacrylate, Dysprosium, Imaging arrays, Image sensors, Computer simulations

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Proceedings Article | 15 January 2003 Paper

Polymer protective coating for wet deep silicon etching processes

Mary Spencer, Chenghong Li, Tony Flaim, Paul Williams, Kim Ruben

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.472717

KEYWORDS: Coating, Silicon, Polymers, Etching, Semiconducting wafers, Electronic circuits, Microelectromechanical systems, Wet etching, Plasma etching, Oxygen

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Proceedings Article | 8 June 1998 Paper

Fast-etch antireflective coating for sub-0.35-um i-line microlithography applications

Paul Williams, Xie Shao, Tony Flaim, James Lamb, Colin Hester

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308762

KEYWORDS: Etching, Photoresist materials, Lithography, Coating, Standards development, Reflectivity, Bottom antireflective coatings, Absorbance, Manufacturing, Radon

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Proceedings Article | 14 June 1996 Paper

Removable organic antireflection coating

John Sturtevant, Tony Flaim, Andrew Eckert, Linda Insalaco, Vandana Krishnamurthy, John Petersen, James Meador

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241872

KEYWORDS: Etching, Semiconducting wafers, Absorption, Antireflective coatings, Photoresist materials, Plasma etching, Deep ultraviolet, Ultraviolet radiation, Plasma, Photoresist processing

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Proceedings Article | 1 June 1992 Paper

Enhancement of deep-UV patterning integrity and process control using antireflective coating

James Lamb, Gregg Barnes, David Koester, Susan Jones, Tony Flaim, Bruce Dudley, Charles Peters

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59774

KEYWORDS: Reflectivity, Deep ultraviolet, Tungsten, Semiconducting wafers, Low pressure chemical vapor deposition, Antireflective coatings, Chemical vapor deposition, Thin films, Scanning electron microscopy, Photomicroscopy

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Proceedings Article | 1 July 1991 Paper

Use of antireflective coatings in deep-UV lithography

James Lamb, Tony Flaim, David Ziger, Satyendra Sethi, Romelia Distasio

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44772

KEYWORDS: Antireflective coatings, Reflectivity, Semiconducting wafers, Lithography, Excimer lasers, Oxides, Deep ultraviolet, Etching, Aluminum, Tungsten

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Showing 5 of 12 publications

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