Dr. Toshihiko Ishihara Profile

Dr. Toshihiko Ishihara

Technology Marketing Consultant at Cymer LLC

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 1 April 2013 Paper

Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

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Proceedings Article | 23 March 2012 Paper

Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

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Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 7 April 2011 Paper

Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 4 March 2010 Paper

Paper

High reliability ArF light source for double patterning immersion lithography

Rostislav Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7640, 76401Q (2010) https://doi.org/10.1117/12.849065

KEYWORDS: Light sources, Double patterning technology, Reliability, Immersion lithography, Electrodes, Lithography, Scanners, Deep ultraviolet, Optical proximity correction, Excimer lasers

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Proceedings Article | 11 December 2009 Paper

Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Slava Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Daniel Riggs, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7520, 752013 (2009) https://doi.org/10.1117/12.839803

KEYWORDS: Light sources, Double patterning technology, Control systems, Scanners, Immersion lithography, Lithography, Deep ultraviolet, Polarization, Optical proximity correction, High volume manufacturing

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Proceedings Article | 16 March 2009 Paper

Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

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Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 15 March 2006 Paper

Paper

XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

Fedor Trintchouk, Toshihiko Ishihara, Walter Gillespie, Richard Ness, Robert Bergstedt, Christian Wittak, Richard Perkins

Proceedings Volume 6154, 615423 (2006) https://doi.org/10.1117/12.658723

KEYWORDS: Light sources, Metrology, Spectroscopy, Scanners, Polarization, Immersion lithography, Acoustics, Manufacturing, Control systems, Pulsed laser operation

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Proceedings Article | 12 May 2005 Paper

Paper

XLA-200: the third-generation ArF MOPA light source for immersion lithography

Toshihiko Ishihara, Robert Rafac, Wayne Dunstan, Fedor Trintchouk, Christian Wittak, Richard Perkins, Robert Bergstedt, Walter Gillespie

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600075

KEYWORDS: Gas lasers, Pulsed laser operation, Polarization, Molybdenum, Light sources, Spectroscopy, Immersion lithography, Fluorine, Birefringence, Beam controllers

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Proceedings Article | 12 May 2005 Paper

Paper

6 kHz MOPA light source for 193 nm immersion lithography

Walter Gillespie, Toshihiko Ishihara, William Partlo, George Ferguson, Michael Simon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601664

KEYWORDS: Acoustics, Fluctuations and noise, Pulsed laser operation, Control systems, Light sources, Head, Immersion lithography, Electrodes, Pulsed power, Laser stabilization

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Proceedings Article | 28 May 2004 Paper

Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia Maley, Vladimir Fleurov, Patrick O'Keeffe, Mary Haviland, Richard Morton, Walter Gillespie, Timothy Dyer, Bryan Moosman, Robert Poole

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

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Proceedings Article | 26 June 2003 Paper

Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 29 June 1998 Paper

Paper

ArF lasers for production of semiconductor devices with CD<0.15 um

Thomas Duffey, Todd Embree, Toshihiko Ishihara, Richard Morton, William Partlo, Tom Watson, Richard Sandstrom

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310731

KEYWORDS: Lithography, Laser applications, Pulsed laser operation, Semiconductors, Excimer lasers, Laser stabilization, Optical damage, Semiconductor lasers, Diffraction gratings, Pulsed power

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Proceedings Article | 8 August 1993 Paper

Paper

Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper

Uday Sengupta, Toshihiko Ishihara, Richard Sandstrom

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150430

KEYWORDS: Electrodes, Pulsed laser operation, Fluorine, Excimer lasers, Laser stabilization, Energy efficiency, Lithography, Optical lithography, Gas lasers, Deep ultraviolet

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Proceedings Article | 1 June 1992 Paper

Paper

Advanced krypton fluoride excimer laser for microlithography

Toshihiko Ishihara, Richard Sandstrom, Christopher Reiser, Uday Sengupta

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130343

KEYWORDS: Optical lithography, Reliability, Excimer lasers, Power supplies, Gas lasers, Krypton, Pulsed laser operation, Safety, Nitrogen, Neon

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Showing 5 of 15 publications

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