Dr. Toshihiko P. Tanaka Profile

Dr. Toshihiko P. Tanaka

Group Leader at Semiconductor Leading Edge Technologies Inc

SPIE Involvement:

Author

Publications (51)

Proceedings Article | 14 October 2011 Paper

Phase defect analysis with actinic full-field EUVL mask blank inspection

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 8166, 81660G (2011) https://doi.org/10.1117/12.898898

KEYWORDS: Inspection, Photomasks, Defect detection, Multilayers, Extreme ultraviolet lithography, Imaging systems, Transmission electron microscopy, Semiconducting wafers, Light scattering, Atomic force microscopy

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SPIE Journal Paper | 1 October 2011

Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, Ichiro Mori

JM3, Vol. 10, Issue 04, 043006, (October 2011) https://doi.org/10.1117/12.10.1117/1.3644984

KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

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Proceedings Article | 20 April 2011 Paper

EB defect inspection of EUV resist patterned wafer for hp 32 nm and beyond

Mari Nozoe, Toshihiko Tanaka, Takashi Kamo, Shinji Kubo, Tomohiro Tamori, Noriaki Takagi, Takeshi Yamane, Tsuneo Terasawa, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7971, 797123 (2011) https://doi.org/10.1117/12.879346

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Extreme ultraviolet, Wafer inspection, Defect inspection, Line width roughness, Image processing, Signal to noise ratio

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Proceedings Article | 7 April 2011 Paper

CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Alan Myers, Yashesh Shroff, Tetsunori Murachi, Gilroy Vandentop, Ichiro Mori

Proceedings Volume 7969, 79691J (2011) https://doi.org/10.1117/12.878672

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

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Proceedings Article | 6 April 2011 Paper

Phase defect printability and actinic dark-field mask blank inspection capability analyses

Tsuneo Terasawa, Takeshi Yamane, Takashi Kamo, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7969, 79690V (2011) https://doi.org/10.1117/12.879398

KEYWORDS: Inspection, Photomasks, Defect detection, Critical dimension metrology, Signal detection, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Extreme ultraviolet, Cameras

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SPIE Journal Paper | 1 April 2011

Light-shield border impact on the printability of extreme-ultraviolet mask

Takashi Kamo, Kazuo Tawarayama, Yuusuke Tanaka, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka, Osamu Suga

JM3, Vol. 10, Issue 02, 023001, (April 2011) https://doi.org/10.1117/12.10.1117/1.3574117

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

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Proceedings Article | 29 March 2011 Paper

Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, Ichiro Mori

Proceedings Volume 7969, 79690J (2011) https://doi.org/10.1117/12.879551

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Defect detection, Extreme ultraviolet, Printing, Scanning electron microscopy, Multilayers, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2010

Impact of extreme ultraviolet mask absorber defect with pattern roughness on lithographic images

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Mihoko Kijima, Toshihiko Tanaka, Osamu Suga

JM3, Vol. 9, Issue 04, 041204, (October 2010) https://doi.org/10.1117/12.10.1117/1.3494618

KEYWORDS: Photomasks, Line width roughness, Image processing, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Tolerancing

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Proceedings Article | 29 September 2010 Paper

Printability of EUVL mask defect detected by actinic blank inspection tool and 199-nm pattern inspection tool

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Toshihiko Tanaka, Kazuo Tawarayama, Osamu Suga, Ichiro Mori

Proceedings Volume 7823, 78231U (2010) https://doi.org/10.1117/12.864305

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Particles, Extreme ultraviolet, Scanning electron microscopy, Lithography, Printing

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Proceedings Article | 29 September 2010 Paper

Improvement of actinic blank inspection and phase defect analysis

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7823, 78231V (2010) https://doi.org/10.1117/12.864290

KEYWORDS: Inspection, CCD cameras, Cameras, Imaging systems, Signal detection, Defect detection, Critical dimension metrology, Multilayers, Interference (communication), Defect inspection

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Proceedings Article | 27 May 2010 Paper

Challenges in flare correction in EUVL lithography for half pitch 22-nm generation

Taiga Uno, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka

Proceedings Volume 7748, 774826 (2010) https://doi.org/10.1117/12.867911

KEYWORDS: Model-based design, Optical proximity correction, Critical dimension metrology, Photomasks, Lithography, Extreme ultraviolet lithography, 3D modeling, Semiconducting wafers, Modulation, Data modeling

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Proceedings Article | 27 May 2010 Paper

Thin absorber EUV mask with light-shield border of etched multilayer and its lithographic performance

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Kazuo Tawarayama, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7748, 774805 (2010) https://doi.org/10.1117/12.867774

KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Lithography, Semiconducting wafers, Coating, Reticles, Deep ultraviolet

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Proceedings Article | 26 May 2010 Paper

Actinic EUVL mask blank inspection capability with time delay integration mode

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7748, 774803 (2010) https://doi.org/10.1117/12.867979

KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Signal detection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Atomic force microscopy, Semiconducting wafers, Multilayers

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SPIE Journal Paper | 1 April 2010

Thin-absorber extreme-ultraviolet lithography mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Takashi Kamo, Yuusuke Tanaka, Toshihiko Tanaka, Iwao Nishiyama, Osamu Suga, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Tsutomu Shoki, Youichi Usui

JM3, Vol. 9, Issue 02, 023005, (April 2010) https://doi.org/10.1117/12.10.1117/1.3378154

KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

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Proceedings Article | 23 March 2010 Paper

Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Kentaro Matsunaga, Daisuke Kawamura, Toshihiko Tanaka, Hiroyuki Tanaka, Shuichi Saito, Ichiro Mori

Proceedings Volume 7636, 76361N (2010) https://doi.org/10.1117/12.846325

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Etching, Photoresist processing, Overlay metrology, Lithography, Scanning electron microscopy

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Proceedings Article | 20 March 2010 Paper

EUV flare correction for the half-pitch 22nm node

Yukiyasu Arisawa, Hajime Aoyama, Taiga Uno, Toshihiko Tanaka

Proceedings Volume 7636, 763618 (2010) https://doi.org/10.1117/12.846487

KEYWORDS: Optical proximity correction, Model-based design, Point spread functions, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Lithography, Space mirrors

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Proceedings Article | 20 March 2010 Paper

Impact of EUV mask absorber defect with pattern-roughness on lithographic images

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Mihoko Kijima, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7636, 76360L (2010) https://doi.org/10.1117/12.846347

KEYWORDS: Photomasks, Line width roughness, Scanning electron microscopy, Extreme ultraviolet lithography, Image processing, Lithography, Extreme ultraviolet, Opacity, Semiconducting wafers, Line edge roughness

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Proceedings Article | 18 March 2010 Paper

Actinic phase defect detection and printability analysis for patterned EUVL mask

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Osamu Suga, Takashi Kamo, Ichiro Mori

Proceedings Volume 7636, 763602 (2010) https://doi.org/10.1117/12.846678

KEYWORDS: Inspection, Photomasks, Defect detection, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Multilayers, EUV optics, Phase shifts, Bridges

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SPIE Journal Paper | 1 October 2009

Process liability evaluation for extreme ultraviolet lithography

Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, Ichiro Mori

JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

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Proceedings Article | 30 September 2009 Paper

Actinic EUVL mask blank inspection capability with time delay integration mode

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7488, 74881B (2009) https://doi.org/10.1117/12.829724

KEYWORDS: Inspection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Signal detection, Photomasks, Defect inspection, Charge-coupled devices, Multilayers, Detection and tracking algorithms

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Proceedings Article | 30 September 2009 Paper

Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Takashi Kamo, Yuusuke Tanaka, Toshihiko Tanaka, Osamu Suga, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Tsutomu Shoki, Youichi Usui

Proceedings Volume 7488, 748818 (2009) https://doi.org/10.1117/12.829873

KEYWORDS: Photomasks, Etching, Image processing, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Scanners, Coating, Optical lithography, Lithography

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Proceedings Article | 11 May 2009 Paper

Actinic EUVL mask blank inspection and phase defect characterization

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7379, 73790H (2009) https://doi.org/10.1117/12.824258

KEYWORDS: Inspection, Defect detection, Photomasks, Particles, Imaging systems, Atomic force microscopy, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Multilayers

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