Dr. Umberto Iessi
Lithography Scanner group mgr at Micron Agrate
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2020 Paper
A. Corno, A. Bordogna, M. Braga, A. Pescalli, F. Ferrario, U. Iessi, P. Canestrari, P. Sharma, M. Salamone, P. Parisi, T. Groos
Proceedings Volume 11325, 113252K (2020) https://doi.org/10.1117/12.2551884
KEYWORDS: Inspection, Manufacturing, Optical lithography, Process control

Proceedings Article | 19 September 2018 Paper
Proceedings Volume 10775, 107750E (2018) https://doi.org/10.1117/12.2326607
KEYWORDS: Photomasks, Inspection, Particles, Pellicles, Contamination, Optical inspection, Lithography

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76402B (2010) https://doi.org/10.1117/12.846552
KEYWORDS: Laser stabilization, Optical simulations, Overlay metrology, Chromatic aberrations, Laser applications, Lithography, Metrology, Distortion, Immersion lithography, Critical dimension metrology

Proceedings Article | 4 March 2010 Paper
Umberto Iessi, Brian Colombo, Johannes Plauth, Benedetta Triulzi, Elio De Chiara, Paolo Canestrari
Proceedings Volume 7640, 76403I (2010) https://doi.org/10.1117/12.846538
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Thin films, Reticles, Statistical analysis, Thin film devices, Wafer-level optics, 193nm lithography, Lithography

Proceedings Article | 16 March 2009 Paper
Pierluigi Rigolli, Gianfranco Capetti, Elio De Chiara, Leonardo Amato, Umberto Iessi, Paolo Canestrari, Christine Llorens, Sanne Smit, Lionel Brige, Johannes Plauth
Proceedings Volume 7274, 72742T (2009) https://doi.org/10.1117/12.814148
KEYWORDS: Overlay metrology, Lithographic illumination, Distortion, Lithography, Semiconducting wafers, Device simulation, Reticles, Yield improvement, Scanners, Wavefronts

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top