Mr. Vincent Renaud Profile

Vincent Renaud

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 12 November 2024 Presentation + Paper

Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV

Yannick Hermans, Stefan Decoster, Chen Wu, Jan Doise, Vincent Renaud, Dieter Van Den Heuvel, Seongho Park, Paulina Rincon-Delgadillo, Zsolt Tőkei

Proceedings Volume 13215, 132150R (2024) https://doi.org/10.1117/12.3034200

KEYWORDS: Optical lithography, Amorphous silicon, Etching, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Semiconducting wafers, Electron beam lithography, Neodymium

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years