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William J. Huang
Applications Engineer at KLA Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 29 September 2010 Paper
Inspection of advanced computational lithography logic reticles using a 193-nm inspection system
Ching-Fang Yu, Mei-Chun Lin, Mei-Tsu Lai, Luke T.H. Hsu, Angus Chin, S. C. Lee, Anthony Yen, Jim Wang, Ellison Chen, David Wu, William Broadbent, William Huang, Zinggang Zhu
Proceedings Volume 7823, 78232F (2010) https://doi.org/10.1117/12.865604
KEYWORDS: Reticles, Inspection, SRAF, Semiconducting wafers, Computational lithography, Control systems, Defect detection, Databases, Model-based design, Optical proximity correction
Proceedings Article | 23 September 2009 Paper
Aerial plane inspection for advanced photomask defect detection
Proceedings Volume 7488, 74882Q (2009) https://doi.org/10.1117/12.830139
KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection
Proceedings Article | 11 May 2009 Paper
Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
Won-Sun Kim, Dong-Hoon Chung, Chan-Uk Jeon, HanKu Cho, William Huang, John Miller, Gregg Inderhees, Becky Pinto, Jiuk Hur, Kihun Park, Jay Han
Proceedings Volume 7379, 73791C (2009) https://doi.org/10.1117/12.824289
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer inspection, Reticles, SRAF, Optical proximity correction, Lithography, Contamination, Image resolution
Proceedings Article | 30 October 2007 Paper
EUV mask process development using DUV inspection system
David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees
Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators
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