Mr. Masatoshi Yamato Profile

Masatoshi Yamato

at Tokyo Electron Ltd

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Author

Publications (19)

Proceedings Article | 13 March 2018 Paper

Desirable material selection on self-aligned multi-patterning

Kyohei Koike, Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Takehiro Seshimo, Takahiro Dazai, Katsumi Ohmori

Proceedings Volume 10586, 105861F (2018) https://doi.org/10.1117/12.2297297

KEYWORDS: Carbon, Silicon, Etching, Polymers, System on a chip, Scanning electron microscopy, Silicon carbide, Oxides, Reactive ion etching, Optical lithography

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Proceedings Article | 5 April 2017 Paper

Pattern optimizing verification of self-align quadruple patterning

Masatoshi Yamato, Kazuki Yamada, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shouhei Yamauchi, Kyohei Koike, Hidetami Yaegashi

Proceedings Volume 10146, 101461M (2017) https://doi.org/10.1117/12.2258154

KEYWORDS: Optical lithography, Double patterning technology, Line edge roughness, Carbon, Etching, Silica, Atomic layer deposition, Silicon films, Lithography, Line width roughness

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Proceedings Article | 27 March 2017 Paper

Optimize of shrink process with X-Y CD bias on hole pattern

Kyohei Koike, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 10146, 101461N (2017) https://doi.org/10.1117/12.2258221

KEYWORDS: Extreme ultraviolet, Etching, Process control, Critical dimension metrology, Optical lithography, Lithography, Inspection, Logic, Immersion lithography, Extreme ultraviolet lithography, 193nm lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Considerations for pattern placement error correction toward 5nm node

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Kyohei Koike, Mark John Maslow, Vadim Timoshkov, Ton Kiers, Paolo Di Lorenzo, Carlos Fonseca

Proceedings Volume 10143, 1014315 (2017) https://doi.org/10.1117/12.2258210

KEYWORDS: Extreme ultraviolet, Lithography, Image processing, Edge roughness, Imaging arrays, Extreme ultraviolet lithography, Line edge roughness, Optical lithography, Critical dimension metrology, Stochastic processes, Etching, Logic, Overlay metrology

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Proceedings Article | 25 March 2016 Paper

CD bias control on hole pattern

Kyohei Koike, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 9779, 97790V (2016) https://doi.org/10.1117/12.2218961

KEYWORDS: Optical lithography, Logic, Lithography, Etching, Process control, System on a chip, Photoresist materials, Line edge roughness, Photoresist processing, Critical dimension metrology, Atomic layer deposition

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Proceedings Article | 25 March 2016 Paper

Contact/Via placement management for N7 logic and beyond

Kenichi Oyama, Arisa Hara, Kyohei Koike, Masatoshi Yamato, Shohei Yamauchi, Sakurako Natori, Hidetami Yaegashi

Proceedings Volume 9779, 97790M (2016) https://doi.org/10.1117/12.2218976

KEYWORDS: Process control, Logic, Field effect transistors, Etching, Materials processing, Optical lithography, Photoresist processing, Photomasks, Lithography, Reactive ion etching, Error analysis, Overlay metrology, Polymers

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Proceedings Article | 25 March 2016 Paper

Considerations for fine hole patterning for the 7nm node

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Kyohei Koike

Proceedings Volume 9779, 97791V (2016) https://doi.org/10.1117/12.2218774

KEYWORDS: Directed self assembly, Optical lithography, Edge roughness, Etching, Atomic layer deposition, Reactive ion etching, Photomasks, Manufacturing, Extreme ultraviolet, Lithography

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Proceedings Article | 20 March 2015 Paper

Recent progress on multipatterning: approach to pattern placement correction

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Noriaki Okabe, Kyohei Koike

Proceedings Volume 9425, 942502 (2015) https://doi.org/10.1117/12.2087003

KEYWORDS: Lithography, Etching, Critical dimension metrology, Photomasks, Optical lithography, Line edge roughness, 193nm lithography, Error analysis, Immersion lithography, Logic

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Proceedings Article | 20 March 2015 Paper

Total fidelity management in self-aligned multiple patterning process

Masatoshi Yamato, Noriaki Okabe, Arisa Hara, Sakurako Natori, Shouhei Yamauchi, Kyohei Koike, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 9425, 94250D (2015) https://doi.org/10.1117/12.2085765

KEYWORDS: Line edge roughness, Optical lithography, Etching, Critical dimension metrology, Double patterning technology, Line width roughness, Photoresist materials, Lithography, Cadmium, System on a chip

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Proceedings Article | 20 March 2015 Paper

Sustainability and applicability of spacer-related patterning towards 7nm node

Kenichi Oyama, Shohei Yamauchi, Arisa Hara, Sakurako Natori, Masatoshi Yamato, Noriaki Okabe, Kyohei Koike, Hidetami Yaegashi

Proceedings Volume 9425, 942514 (2015) https://doi.org/10.1117/12.2085730

KEYWORDS: Optical lithography, Etching, System on a chip, Critical dimension metrology, Metals, Lithography, Carbon, Logic devices, Process control, Copper

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Proceedings Article | 17 March 2015 Paper

Photoresist performance modification through plasma treatment

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Noriaki Okabe, Kyohei Koike

Proceedings Volume 9428, 94280H (2015) https://doi.org/10.1117/12.2085093

KEYWORDS: Etching, Line edge roughness, Optical lithography, Photoresist materials, Plasma treatment, Fabrication, Lithography, Edge roughness, Control systems, System on a chip

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Proceedings Article | 31 March 2014 Paper

Pattern fidelity in multiple-patterning process

Masatoshi Yamato, Sakurako Natori, Shohei Yamauchi, Arisa Hara, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 9052, 90520R (2014) https://doi.org/10.1117/12.2046643

KEYWORDS: Line edge roughness, Etching, System on a chip, Line width roughness, Lithography, Semiconductors, Critical dimension metrology, Scanning electron microscopy, Double patterning technology, Photoresist materials

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Proceedings Article | 27 March 2014 Paper

Robust complementary technique with multiple-patterning for sub-10 nm node device

Kenichi Oyama, Shohei Yamauchi, Sakurako Natori, Arisa Hara, Masatoshi Yamato, Hidetami Yaegashi

Proceedings Volume 9051, 90510V (2014) https://doi.org/10.1117/12.2046236

KEYWORDS: Optical lithography, Extreme ultraviolet, Etching, Double patterning technology, Lithography, Extreme ultraviolet lithography, Reactive ion etching, 193nm lithography, Logic

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Proceedings Article | 27 March 2014 Paper

Recent progress on multiple-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato

Proceedings Volume 9051, 90510X (2014) https://doi.org/10.1117/12.2046135

KEYWORDS: Line edge roughness, Optical lithography, Etching, Photomasks, Photoresist processing, Lithography, Source mask optimization, Projection systems, Extreme ultraviolet, Plasma

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Proceedings Article | 27 March 2014 Paper

Innovative solutions on 193 immersion-based self-aligned multiple patterning

Sakurako Natori, Shohei Yamauchi, Arisa Hara, Masatoshi Yamato, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 9051, 90511E (2014) https://doi.org/10.1117/12.2046220

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Photomasks, Chemical vapor deposition, Etching, Lithography, Line width roughness, Manufacturing, Carbon, Photoresist materials

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Proceedings Article | 29 March 2013 Paper

Sustainable scaling technique on double-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato

Proceedings Volume 8682, 868204 (2013) https://doi.org/10.1117/12.2011359

KEYWORDS: Line edge roughness, Etching, Double patterning technology, Critical dimension metrology, Photoresist processing, Extreme ultraviolet, Electron beam lithography, Lithography, System on a chip, Optical lithography

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Proceedings Article | 29 March 2013 Paper

Process requirement of self-aligned multiple patterning

Sakurako Natori, Shohei Yamauchi, Arisa Hara, Masatoshi Yamato, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 8682, 86821F (2013) https://doi.org/10.1117/12.2011398

KEYWORDS: Optical lithography, Extreme ultraviolet, Etching, Carbon, Double patterning technology, Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Photomasks, Oxides

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Proceedings Article | 29 March 2013 Paper

Extendibility of self-aligned type multiple patterning for further scaling

Shohei Yamauchi, Arisa Hara, Kenichi Oyama, Sakurako Natori, Masatoshi Yamato, Hidetami Yaegashi

Proceedings Volume 8682, 86821D (2013) https://doi.org/10.1117/12.2011953

KEYWORDS: Double patterning technology, Optical lithography, Semiconductors, Immersion lithography, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Etching, Photomasks, Standards development

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Proceedings Article | 29 March 2013 Paper

Noble approaches on double-patterning process toward sub-15nm

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato

Proceedings Volume 8685, 86850M (2013) https://doi.org/10.1117/12.2011962

KEYWORDS: Double patterning technology, Line edge roughness, Optical lithography, Etching, Lithography, Photoresist processing, Logic devices, Line width roughness, Extreme ultraviolet lithography, 193nm lithography

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Showing 5 of 19 publications

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