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Yandong Luo
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Publications (1)
Proceedings Article | 20 March 2018 Paper
Relaxing LER requirement in EUV lithography
Proceedings Volume 10588, 105880O (2018) https://doi.org/10.1117/12.2297515
KEYWORDS: Line edge roughness, Metals, Optical lithography, Dielectrics, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Stochastic processes, Very large scale integration, Electrons
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