Mr. Yasuhiro Ohmura Profile

Yasuhiro Ohmura

General Manager at Nikon Corp

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 15 March 2016 Paper

Paper

Next-generation immersion scanner optimizing on-product performance for 7nm node

Yasushi Yoda, Akira Hayakawa, Satoshi Ishiyama, Yasuhiro Ohmura, Issei Fujimoto, Toru Hirayama, Yuji Shiba, Kazuo Masaki, Yuichi Shibazaki

Proceedings Volume 9780, 978012 (2016) https://doi.org/10.1117/12.2218955

KEYWORDS: Scanners, Lithography, Lithographic illumination, Control systems, Optical alignment, Semiconductors, Optical lithography, Yield improvement, Immersion lithography, Manufacturing, Semiconducting wafers, Signal processing, Distortion, Light sources, Atrial fibrillation, Wavefronts

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Proceedings Article | 15 March 2016 Paper

Paper

High-order aberration control during exposure for leading-edge lithography projection optics

Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, Hidetaka Kawahara

Proceedings Volume 9780, 97800Y (2016) https://doi.org/10.1117/12.2218840

KEYWORDS: Wavefronts, Control systems, Deformable mirrors, Distortion, Optical lithography, Lithography, Projection systems, Overlay metrology, Performance modeling, Mirrors

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Proceedings Article | 12 April 2013 Paper

Paper

High-productivity immersion scanner enabling 1xnm hp manufacturing

Yosuke Shirata, Yuichi Shibazaki, Junichi Kosugi, Takahisa Kikuchi, Yasuhiro Ohmura

Proceedings Volume 8683, 86831K (2013) https://doi.org/10.1117/12.2011123

KEYWORDS: Semiconducting wafers, Distortion, Reticles, Sensors, Scanners, Manufacturing, Overlay metrology, Lithography, Atrial fibrillation, Fiber optic illuminators

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Proceedings Article | 12 April 2013 Paper

Paper

Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay

Yohei Fujishima, Satoshi Ishiyama, Susumu Isago, Akihiro Fukui, Hajime Yamamoto, Toru Hirayama, Tomoyuki Matsuyama, Yasuhiro Ohmura

Proceedings Volume 8683, 86831I (2013) https://doi.org/10.1117/12.2010908

KEYWORDS: Distortion, Reticles, Lithography, Switching, Water, Semiconducting wafers, Imaging systems, Deformable mirrors, Lithographic lenses, Immersion lithography

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Proceedings Article | 13 March 2012 Paper

Paper

Imaging optics setup and optimization on scanner for SMO generation process

Tomoyuki Matsuyama, Taro Ogata, Yasushi Mizuno, Yasuhiro Ohmura

Proceedings Volume 8326, 83260N (2012) https://doi.org/10.1117/12.916588

KEYWORDS: Fiber optic illuminators, Source mask optimization, Modulation, Scanners, Point spread functions, Distortion, Semiconducting wafers, Photomasks, Imaging systems, Lithography

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Proceedings Article | 23 March 2011 Paper

Paper

An aberration control of projection optics for multi-patterning lithography

Yasuhiro Ohmura, Taro Ogata, Toru Hirayama, Hisashi Nishinaga, Takeshi Shiota, Satoshi Ishiyama, Susumu Isago, Hidetaka Kawahara, Tomoyuki Matsuyama

Proceedings Volume 7973, 79730W (2011) https://doi.org/10.1117/12.879616

KEYWORDS: Wavefronts, Switching, Semiconducting wafers, Deformable mirrors, Polarization, Image processing, Glasses, Standards development, Critical dimension metrology, Monochromatic aberrations

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Proceedings Article | 16 March 2009 Paper

Paper

True polarization characteristics of hyper-NA optics excluding impact of measurement system

Toru Fujii, Ken-ichi Muramatsu, Noriyuki Matsuo, Yasihiro Ohmura, Masayasu Sawada

Proceedings Volume 7274, 72743K (2009) https://doi.org/10.1117/12.813611

KEYWORDS: Birefringence, Polarization, Optical testing, Projection systems, Crystals, Wavefronts, Lithography, Optical simulations, Matrices, Signal attenuation

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Proceedings Article | 4 December 2008 Paper

Paper

An imaging system for extended ArF immersion lithography

Tomoyuki Matsuyama, Yasuhiro Ohmura, Toshiharu Nakashima, Yusaku Uehara

Proceedings Volume 7140, 714013 (2008) https://doi.org/10.1117/12.804658

KEYWORDS: Imaging systems, Control systems, Wavefronts, Optical lithography, Double patterning technology, Optical proximity correction, Scanners, Metrology, Reticles, Lithography

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Proceedings Article | 12 March 2008 Paper

Paper

An intelligent imaging system for ArF scanner

Tomoyuki Matsuyama, Yasuhiro Ohmura, Toshiharu Nakashima, Yusaku Uehara, Taro Ogata, Hisashi Nishinaga, Hironori Ikezawa, Tsuyoshi Toki, Slava Rokitski, James Bonafede

Proceedings Volume 6924, 69241S (2008) https://doi.org/10.1117/12.771942

KEYWORDS: Imaging systems, Scanners, Optical proximity correction, Line width roughness, Control systems, Wavefronts, Optical lithography, Double patterning technology, Reticles, Metrology

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Proceedings Article | 7 March 2008 Paper

Paper

Thermal aberration control in projection lens

Toshiharu Nakashima, Yasuhiro Ohmura, Taro Ogata, Yusaku Uehara, Hisashi Nishinaga, Tomoyuki Matsuyama

Proceedings Volume 6924, 69241V (2008) https://doi.org/10.1117/12.772586

KEYWORDS: Control systems, Monochromatic aberrations, Scanners, Photomasks, Semiconducting wafers, Wavefront aberrations, Manufacturing, Lithography, Artificial intelligence, Cadmium sulfide

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Proceedings Article | 7 March 2008 Paper

Paper

Studies of high index immersion lithography

Yasuhiro Ohmura, Hiroyuki Nagasaka, Tomoyuki Matsuyama, Toshiharu Nakashima, Teruki Kobayashi, Motoi Ueda, Soichi Owa

Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622

KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

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Proceedings Article | 3 May 2007 Paper

Paper

Current status of water immersion lithography and prospect of higher index method

Soichi Owa, Katsushi Nakano, Hiroyuki Nagasaka, Hirotaka Kohno, Yasuhiro Ohmura, Martin McCallum

Proceedings Volume 6533, 653304 (2007) https://doi.org/10.1117/12.731916

KEYWORDS: Semiconducting wafers, Imaging systems, Double patterning technology, Water, Immersion lithography, Manufacturing, Lithography, Refractive index, Photoresist developing, Thin film coatings

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Proceedings Article | 26 March 2007 Paper

Paper

Thermal aberration control for low-k1 lithography

Yusaku Uehara, Tomoyuki Matsuyama, Toshiharu Nakashima, Yasuhiro Ohmura, Taro Ogata, Kosuke Suzuki, Noriaki Tokuda

Proceedings Volume 6520, 65202V (2007) https://doi.org/10.1117/12.711440

KEYWORDS: Monochromatic aberrations, Lithography, Lithographic illumination, Process control, Light sources, Resolution enhancement technologies, Optical lithography, Switching, Control systems, Phase shifts

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Proceedings Article | 26 March 2007 Paper

Paper

Current status of high-index immersion lithography development

Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa

Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252

KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

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Proceedings Article | 26 March 2007 Paper

Paper

Catadioptric projection lens for 1.3 NA scanner

Tomoyuki Matsuyama, Yasuhiro Ohmura, Yohei Fujishima, Takashi Koyama

Proceedings Volume 6520, 652021 (2007) https://doi.org/10.1117/12.711340

KEYWORDS: Combined lens-mirror systems, Mirrors, Chromatic aberrations, Lens design, Wavefronts, Optical design, Refractive index, Surface roughness, Scanners, Deep ultraviolet

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Proceedings Article | 18 July 2006 Paper

Paper

The optical design for microlithographic lenses

Yasuhiro Ohmura

Proceedings Volume 6342, 63421T (2006) https://doi.org/10.1117/12.692315

KEYWORDS: Optical design, Lenses, Mirrors, Combined lens-mirror systems, Lens design, Distortion, Reticles, Refractive index, Chemical elements, Optical lithography

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Proceedings Article | 15 March 2006 Paper

Paper

Current status and future prospect of immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Katsushi Nakano, Yasuhiro Ohmura

Proceedings Volume 6154, 615408 (2006) https://doi.org/10.1117/12.656887

KEYWORDS: Optics manufacturing, Semiconducting wafers, Water, Resonance energy transfer, Double patterning technology, Immersion lithography, Scanners, Combined lens-mirror systems, Particles, Projection systems

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Proceedings Article | 15 March 2006 Paper

Paper

The lithographic lens: its history and evolution

Tomoyuki Matsuyama, Yasuhiro Ohmura, David Williamson

Proceedings Volume 6154, 615403 (2006) https://doi.org/10.1117/12.656163

KEYWORDS: Lithography, Optical design, Lens design, Aspheric lenses, Kinematics, Lens manufacturing, Wavefronts, Metrology, Manufacturing, Glasses

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Proceedings Article | 15 March 2006 Paper

Paper

A hyper-NA projection lens for ArF immersion exposure tool

Hironori Ikezawa, Yasuhiro Ohmura, Tomoyuki Matsuyama, Yusaku Uehara, Toshiro Ishiyama

Proceedings Volume 6154, 615421 (2006) https://doi.org/10.1117/12.656083

KEYWORDS: Polarization, Projection systems, Mirrors, Combined lens-mirror systems, Refractor telescopes, Monochromatic aberrations, Semiconducting wafers, Wafer-level optics, Wavefronts, Resolution enhancement technologies

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Proceedings Article | 26 June 2003 Paper

Paper

Nikon F2 exposure tool development

Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451

KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

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Proceedings Article | 26 June 2003 Paper

Paper

Catadioptric lens development for DUV and VUV projection optics

Yasuhiro Ohmura, Masahiro Nakagawa, Tomoyuki Matsuyama, Yuichi Shibazaki

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485462

KEYWORDS: Combined lens-mirror systems, Refractor telescopes, Projection systems, Mirrors, Chromatic aberrations, Optical components, Glasses, Calcium, Deep ultraviolet, Vacuum ultraviolet

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Proceedings Article | 30 July 2002 Paper

Paper

Progress of Nikon's F2-exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474607

KEYWORDS: Birefringence, Crystals, Projection systems, Optical design, Wavefronts, Lithography, Chemical species, Absorption, Combined lens-mirror systems, Calcium

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Proceedings Article | 30 July 2002 Paper

Paper

High-NA and low-residual-aberration projection lens for DUV scanner

Tomoyuki Matsuyama, Yuichi Shibazaki, Yasuhiro Ohmura, Takeshi Suzuki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474617

KEYWORDS: Birefringence, Calcium, Kinematics, Imaging systems, Optical design, Chemical elements, Optical components, Deep ultraviolet, Scanners, Chromatic aberrations

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Proceedings Article | 14 September 2001 Paper

Paper

Current status of Nikon's F2 exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Masato Hatasawa, Takashi Mori, Issei Tanaka

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435631

KEYWORDS: Photomasks, Projection systems, Coating, Combined lens-mirror systems, Oxygen, Lithography, Optics manufacturing, Mirrors, Optical components, Logic devices

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Showing 5 of 24 publications

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