Dr. Yong Liu Profile

Dr. Yong Liu

Principal Engineer at Nanotech Corp

SPIE Involvement:

Author

Area of Expertise:

GPU , simulation , calibration , Lithograpy , model , eda

Websites:

Company Website

Publications (14)

Proceedings Article | 13 March 2012 Paper

A computation of partially coherent imaging illuminated by a polarized source via the stack pupil shift matrix approach

Yu Chen, Yong Liu

Proceedings Volume 8326, 832628 (2012) https://doi.org/10.1117/12.916260

KEYWORDS: Polarization, Coherence imaging, Computer simulations, Photomasks, Optical proximity correction, System on a chip, Matrices, Convolution, Error analysis, Cadmium sulfide

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm

Linyong Pang, Yong Liu, Thuc Dam, Kresimir Mihic, Thomas Cecil, Dan Abrams

Proceedings Volume 6730, 673052 (2007) https://doi.org/10.1117/12.754568

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Lithography, Optical proximity correction, Diffraction, Inverse problems, Phase shifts, Resolution enhancement technologies, Manufacturing

Read Abstract +

Proceedings Article | 15 May 2007 Paper

Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm

Linyong Pang, Yong Liu, Dan Abrams

Proceedings Volume 6607, 660739 (2007) https://doi.org/10.1117/12.729028

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Optical proximity correction, Lithography, Inverse problems, Phase shifts, Diffraction, Model-based design, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Inverse lithography technology at low k1: placement and accuracy of assist features

Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams

Proceedings Volume 6349, 63494T (2006) https://doi.org/10.1117/12.693039

KEYWORDS: Photomasks, SRAF, Lithography, Semiconductors, Manufacturing, Computer simulations, Phase shifts, Tolerancing, Resolution enhancement technologies, Chemical elements

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Inverse lithography technology (ILT): What is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams

Proceedings Volume 6283, 62830X (2006) https://doi.org/10.1117/12.681857

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Inspection, Vestigial sideband modulation, Mask making, Deep ultraviolet, Inverse optics

Read Abstract +

Proceedings Article | 21 March 2006 Paper

Inverse lithography technology at chip scale

Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Proceedings Volume 6154, 615414 (2006) https://doi.org/10.1117/12.656827

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Image processing, Semiconductors

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Enhancing DRAM printing process window by using inverse lithography technology (ILT)

Chih-Wei Chu, Becky Tsao, Karl Chiou, Snow Lee, Jerry Huang, Yong Liu, Timothy Lin, Andrew Moore, Linyong Pang

Proceedings Volume 6154, 61543O (2006) https://doi.org/10.1117/12.657015

KEYWORDS: Photomasks, Lithography, Image quality, Semiconductors, Semiconducting wafers, Printing, Scanning electron microscopy, Light sources, Quality measurement, Manufacturing

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation

Chi-Yuan Hung, Bin Zhang, Eric Guo, Linyong Pang, Yong Liu, Kechang Wang, Grace Dai

Proceedings Volume 6154, 61541M (2006) https://doi.org/10.1117/12.655728

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Calibration, Lithographic illumination, Wafer-level optics, Vestigial sideband modulation, SRAF, Inspection

Read Abstract +

Proceedings Article | 8 November 2005 Paper

Inverse lithography technology principles in practice: unintuitive patterns

Yong Liu, Dan Abrams, Linyong Pang, Andrew Moore

Proceedings Volume 5992, 599231 (2005) https://doi.org/10.1117/12.632366

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Image segmentation, Image quality, Resolution enhancement technologies, Manufacturing, Semiconductors, Printing, Inverse optics

Read Abstract +

Proceedings Article | 8 November 2005 Paper

Manufacturability study of masks created by inverse lithography technology (ILT)

Patrick Martin, C. Progler, G. Xiao, R. Gray, L. Pang, Y. Liu

Proceedings Volume 5992, 599235 (2005) https://doi.org/10.1117/12.633200

KEYWORDS: Photomasks, Inspection, Manufacturing, Optical proximity correction, Lithography, Semiconducting wafers, Imaging systems, Metrology, Resolution enhancement technologies, Binary data

Read Abstract +

Proceedings Article | 5 November 2005 Paper

First 65nm tape-out using inverse lithography technology (ILT)

Chi-Yuan Hung, Bin Zhang, Deming Tang, Eric Guo, Linyong Pang, Yong Liu, Andrew Moore, Kechang Wang

Proceedings Volume 5992, 59921U (2005) https://doi.org/10.1117/12.632415

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Inspection, Wafer-level optics, Calibration, Manufacturing, Image segmentation

Read Abstract +

Proceedings Article | 5 November 2005 Paper

Real-world impacts of inverse lithography technology

Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Proceedings Volume 5992, 59921Z (2005) https://doi.org/10.1117/12.632211

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Semiconductors, Image segmentation

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Full-chip single exposure vortex mask for contact/via

Yong Liu, Dun Liu, James Hu

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600111

KEYWORDS: Photomasks, Phase shifts, Optical proximity correction, Image quality, Logic, Metals, Lithography, Resolution enhancement technologies, Software development, Optical lithography

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Single-exposure general vortex phase-shift mask for contact hole

Yong Liu, Dun Liu, James Hu

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.567874

KEYWORDS: Photomasks, Phase shifts, Optical proximity correction, Image quality, Neodymium, Double patterning technology, Destructive interference, Light sources, Computer simulations, Logic

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years