Yoshinori Hagio
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 11 May 2009 Paper
Yoshinori Hagio, Ichirota Nagahama, Yasuo Matsuoka, Hidefumi Mukai, Koji Hashimoto
Proceedings Volume 7379, 73790V (2009) https://doi.org/10.1117/12.824272
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Lithography, Optical inspection, Scanning electron microscopy, Mask making, Tolerancing, Electron beams

Proceedings Article | 13 March 2009 Paper
Yoshinori Hagio, Ichirota Nagahama, Yasuo Matsuoka, Hidefumi Mukai, Koji Hashimoto
Proceedings Volume 7275, 72750V (2009) https://doi.org/10.1117/12.813648
KEYWORDS: Inspection, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Reactive ion etching, Scanning electron microscopy, Double patterning technology, Photomasks, Wafer inspection

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