Mr. Yoshinori Momonoi Profile

Yoshinori Momonoi

General Manager at Hitachi High-Tech Corporation

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Author

Publications (12)

Proceedings Article | 26 September 2019 Paper

Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement (Poster presentation)

Hiroshi Fukuda, Yoshinori Momonoi, Kei Sakai

Proceedings Volume 11147, 111471A (2019) https://doi.org/10.1117/12.2535664

KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Critical dimension metrology, Inspection, Optical inspection, Chemical reactions, Monte Carlo methods, Photomasks, Semiconducting wafers, Ranging

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SPIE Journal Paper | 18 September 2019

CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

JM3, Vol. 18, Issue 03, 034004, (September 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.3.034004

SPIE Journal Paper | 3 May 2019 Open Access

Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement

Hiroshi Fukuda, Yoshinori Momonoi, Kei Sakai

JM3, Vol. 18, Issue 02, 024002, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024002

KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

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Proceedings Article | 29 March 2019 Presentation + Paper

What is prevalent CD-SEM's role in EUV era?

Zhigang Wang, Yoshinori Momonoi, Katsumi Setoguchi, Makoto Suzuki, Satoru Yamaguchi

Proceedings Volume 10959, 1095914 (2019) https://doi.org/10.1117/12.2514697

KEYWORDS: Metrology, Extreme ultraviolet, Image processing, Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Process control, Lithography, Error analysis

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Proceedings Article | 26 March 2019 Paper

High-resolution low-shrinkage CD metrology for EUV resist using high voltage CD-SEM

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

Proceedings Volume 10959, 109591D (2019) https://doi.org/10.1117/12.2514797

KEYWORDS: Extreme ultraviolet, Monte Carlo methods, Critical dimension metrology, Line edge roughness, Electrons, Spatial resolution, Extreme ultraviolet lithography, Metrology, Scanning electron microscopy

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SPIE Journal Paper | 23 July 2018

Measurement of pattern roughness and local size variation using CD-SEM

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

JM3, Vol. 17, Issue 04, 041004, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041004

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

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Proceedings Article | 13 March 2018 Paper

Measurement of pattern roughness and local size variation using CD-SEM: current status

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

Proceedings Volume 10585, 105850H (2018) https://doi.org/10.1117/12.2299633

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Critical dimension metrology, Detection and tracking algorithms, Metrology, Reliability, Process control, Image filtering

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SPIE Journal Paper | 29 June 2017

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

JM3, Vol. 16, Issue 02, 024004, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.024004

KEYWORDS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering

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Proceedings Article | 28 March 2017 Paper

High-precision CD measurement using energy-filtering SEM techniques

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi, Hajime Kawano

Proceedings Volume 10145, 101451K (2017) https://doi.org/10.1117/12.2257205

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Semiconductors, Logic, Logic devices, 3D metrology, Process control, Electrons, Selenium, Silicon, Critical dimension metrology, Image filtering

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Proceedings Article | 5 April 2012 Paper

Methodology for establishing CD-SEM robust metrology algorithm for development cycles applications

Keiichiro Hitomi, Erin Lavigne, Shoji Hotta, Yoshinori Momonoi, Matthew Colburn, Atsuko Yamaguchi, Katsuhiro Sasada, Tatsuya Maeda

Proceedings Volume 8324, 83241G (2012) https://doi.org/10.1117/12.916492

KEYWORDS: Metrology, Critical dimension metrology, Photoresist materials, Etching, Image processing, Algorithm development, Lithography, Double patterning technology, Cadmium, Semiconductors

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Proceedings Article | 2 April 2010 Paper

CD-SEM metrology of spike detection on sub-40 nm contact holes

Yoshinori Momonoi, Taro Osabe, Atsuko Yamaguchi, Erin Mclellan Martin, Hajime Koyanagi, Matthew Colburn, Kazuyoshi Torii

Proceedings Volume 7638, 76380Q (2010) https://doi.org/10.1117/12.846656

KEYWORDS: Semiconducting wafers, Lithography, Line edge roughness, Metrology, Edge roughness, Reliability, Scanning electron microscopy, Process control, Dielectric breakdown, Image processing

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Proceedings Article | 24 March 2009 Paper

Three-dimensional profile extraction from CD-SEM top-view image

Atsuko Yamaguchi, Yoshinori Momonoi, Ken Murayama, Hiroki Kawada, Junichi Tanaka

Proceedings Volume 7272, 72722G (2009) https://doi.org/10.1117/12.816208

KEYWORDS: Line edge roughness, 3D metrology, Atomic force microscopy, 3D image processing, Scanning electron microscopy, Edge detection, Electron microscopes, Atomic force microscope, Feature extraction, Electron beams

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Showing 5 of 12 publications

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