Dr. Yu-Po Tang Profile

Dr. Yu-Po Tang

at Synopsys Taiwan Co., Ltd.

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Author

Publications (6)

Proceedings Article | 25 May 2022 Presentation + Paper

Curvilinear mask solutions for full-chip EUV lithography

Kevin Hooker, Guangming Xiao, Yu-Po Tang, Yunqiang Zhang, Moongyu Jeong, John Valadez, Kevin Lucas

Proceedings Volume 12054, 1205407 (2022) https://doi.org/10.1117/12.2618392

KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Machine learning, Semiconducting wafers, Manufacturing, Deep ultraviolet

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Proceedings Article | 31 March 2014 Paper

Resist profile simulation with fast lithography model

Yan-Ying He, Chih-Shiang Chou, Yu-Po Tang, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9052, 90520Y (2014) https://doi.org/10.1117/12.2045538

KEYWORDS: 3D modeling, Scanning electron microscopy, Diffusion, Data modeling, Lithography, Calibration, Semiconducting wafers, Visual process modeling, 3D image processing, Optical proximity correction

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Proceedings Article | 10 April 2013 Paper

Joint calibration of 3D resist image and CDSEM

C. S. Chou, Y. Y. He, Y. P. Tang, Y. T. Chang, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8681, 868113 (2013) https://doi.org/10.1117/12.2010846

KEYWORDS: 3D modeling, Scanning electron microscopy, Photoresist materials, Diffusion, Calibration, Critical dimension metrology, Performance modeling, 3D image processing, Optical proximity correction, Lithography

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Proceedings Article | 14 March 2012 Paper

Building 3D aerial image in photoresist with reconstructed mask image acquired with optical microscope

C. S. Chou, Y. P. Tang, F. S. Chu, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 83261L (2012) https://doi.org/10.1117/12.917794

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, 3D image reconstruction, Photoresist materials, Scanning electron microscopy, Reflection, Calibration, Refraction, 3D acquisition

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Proceedings Article | 13 March 2012 Paper

Multiple-image-depth modeling for hotspot and AF printing detections

Y. P. Tang, C. S. Chou, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 832619 (2012) https://doi.org/10.1117/12.917402

KEYWORDS: Printing, Optical proximity correction, Atrial fibrillation, Calibration, Semiconducting wafers, Data modeling, 3D modeling, SRAF, Scanning electron microscopy, Cadmium

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Proceedings Article | 16 March 2009 Paper

OPC segmentation: dilemma between degree-of-freedom and stability with some relieves

Y. P. Tang, J. H. Feng, M. H. Chih, C. K. Tsai, W. C. Huang, C. C. Kuo, R. G. Liu, H. T. Lin, Y. C. Ku

Proceedings Volume 7274, 72742G (2009) https://doi.org/10.1117/12.814907

KEYWORDS: Optical proximity correction, Image segmentation, Optical lithography, Resolution enhancement technologies, Lithographic illumination, Detection and tracking algorithms, Neodymium, Semiconductor manufacturing, Immersion lithography, Photomasks

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Showing 5 of 6 publications

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