Sn doping of β-Ga2O3 grown by conventional plasma-assisted molecular beam epitaxy (PAMBE) and via metal oxide catalyzed epitaxy (MOCATAXY) using a supplied indium flux during MBE growth was investigated. Sn doping of (010) β-Ga2O3 via MOCATAXY allowed for sharper doping profiles as well as a wider range of donor concentrations from 4 x 10^16 cm-3 to 2 x 10^19 cm-3 with a maximum Hall mobility of 136 cm2/Vs and a Sn donor level of 77 meV below the conduction band. Expansion of MOCATAXY to (001) β-Ga2O3 also showed improved Hall mobility, growth rates, and smoother films in this orientation.
Epitaxial growth of β-Ga2O3 was performed on (110) substrate by plasma-assisted molecular beam epitaxy (PAMBE). Investigation of (010) substrates has revealed that (110) facets are revealed the chevron consistent features in reflection high-energy electron diffraction (RHEED) studies, which indicates (110) is a natural plane in β-Ga2O3 and exhibits atomically flat surface after Ga polishing. The growth rate dependence on Ga flux study suggests that the growth rate is not reduced on the (110) plane compared to that of (010). Atomic force microscopy (AFM) shows smooth surface morphology was obtained by growing on (110) substrates.
We report on the design, demonstration and current status of tunnel-injected ultra-violet light emitting diodes (UV LEDs). III-Nitride ultraviolet light emitting diodes (UV LEDs) are promising in various applications including sterilization, water purification and medical sensing. However, both the light extraction efficiency and electrical efficiency face fundamental challenges for the conventional UV LED structures. This stems from the poor p-type conductivity and high p-type contact resistance. Hole injection using interband tunneling provides an elegant solution to the fundamental issues of UV LEDs, and can resolve both the hole injection and light extraction issues that have been the primary problems for UV LEDs. In this talk, we will discuss in detail the heterostructure design and demonstration through polarization engineering to realize efficient interband tunneling in ultra-wide band gap AlGaN material. We will then outline some of the growth and fabrication challenges, and discuss our approaches to overcome these. Finally, we will present our results on tunnel-injected UV LEDs that have enabled us to achieve efficient UV light emission in the UVA and UVB wavelength ranges with on-wafer efficiencies comparable to state-of-the-art values [1,2,3].
References:
1. Yuewei Zhang, et al. ''Interband tunneling for hole injection in III-nitride ultraviolet emitters", Appl. Phys. Lett. 106, 141103 (2015);
2. Yuewei Zhang, et al. "Design of p-type cladding layers for tunnel-injected UV-A light emitting diodes", Appl. Phys. Lett. 109, 191105 (2016);
3. Yuewei Zhang, et al. “Tunnel-injected sub-260 nm ultraviolet light emitting diodes”, Appl. Phys. Lett. 110, 201102 (2017).
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