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Yuji Shibasaki
at Tokyo Institute of Technology
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Publications (1)
Proceedings Article | 4 May 2005 Paper
A new 193nm resist
Toshiaki Fukuhara, Taku Hirayama, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda, Masayuki Endo, Masaru Sasago
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598342
KEYWORDS: Polymers, Transparency, Photoresist materials, Magnesium, Polymerization, Infrared spectroscopy, Chlorine, Spectroscopy, Vacuum ultraviolet, Chemically amplified resists
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