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YunSheng Xia
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Publications (1)
Proceedings Article | 20 March 2020 Paper
New improving metrology for advanced memory devices with high transmission attenuated phase shift mask
Chia-Hung Chen, Sheng-Tsung Tsao, CongCong Fan, Jie Du, Richer Yang, Asei Chou, Kunyuan Chen, Jimmy Chang, JunJun Zhang, Wallace He, Leslie Zhang, YunSheng Xia
Proceedings Volume 11325, 113252U (2020) https://doi.org/10.1117/12.2552025
KEYWORDS: Optical alignment, Photomasks, Semiconducting wafers, Metrology, Phase shifts, Overlay metrology, Optical proximity correction, Diffraction
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