Dr. Yuri Aksenov Profile

Dr. Yuri Aksenov

at Philips Research Labs

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 15 March 2006 Paper

Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes

Yuri Aksenov, Peter Zandbergen, Masaki Yoshizawa

Proceedings Volume 6154, 61541H (2006) https://doi.org/10.1117/12.659345

KEYWORDS: Diffraction, Reticles, Photomasks, Binary data, Polarization, Signal attenuation, Chromium, Optical proximity correction, Printing, Phase shifts

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Proceedings Article | 14 March 2006 Paper

Experimental verification of improved printability for litho-driven designs

Johannes van Wingerden, Laurent Le Cam, Rene Wientjes, Michael Benndorf, Yorick Trouiller, Jerome Belledent, Rob Morton, Yuri Aksenov

Proceedings Volume 6156, 61560O (2006) https://doi.org/10.1117/12.656359

KEYWORDS: Critical dimension metrology, Lithography, Logic, Scanners, Semiconductors, Transistors, Design for manufacturing, Group IV semiconductors, Optical proximity correction, Process control

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Proceedings Article | 16 June 2005 Paper

Progress in 193nm immersion lithography at IMEC

K. Ronse, G. Vandenberghe, E. Hendrickx, L. Leunissen, Y. Aksenov

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637271

KEYWORDS: Photomasks, Immersion lithography, Polarization, Atrial fibrillation, Lithography, Critical dimension metrology, Reticles, Semiconducting wafers, Diffraction, 193nm lithography

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Proceedings Article | 12 May 2005 Paper

Influence of mask induced polarization effects on a pattern printability

Yuri Aksenov, Peter Dirksen, Xiuhong Wei, Peter Zandbergen

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597438

KEYWORDS: Diffraction, Photomasks, Polarization, Chromium, Binary data, Semiconducting wafers, Critical dimension metrology, Reticles, Optical proximity correction, Near field

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Proceedings Article | 12 May 2005 Paper

Three-dimensional rigorous simulation of mask-induced polarization

Xiuhong Wei, H. Urbach, Arthur Wachters, Yuri Aksenov

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597732

KEYWORDS: Chromium, Photomasks, 3D modeling, Polarization, Binary data, Dielectric polarization, Finite element methods, Magnetism, Mathematical modeling, Maxwell's equations

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Proceedings Article | 12 May 2005 Paper

Mask induced polarization effects at high NA

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Bruce Smith, Philippe Foubert, L. Leunissen, Vicky Philipsen, Yuri Aksenov

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602422

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Refractive index, Spectroscopy, Silicon, Diffraction, Phase shifting, Refraction

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Proceedings Article | 5 May 2005 Paper

Evaluating design for manufacturing with process capability analysis

Johannes van Wingerden, Laurent Le Cam, Manish Garg, Yuri Aksenov, Peter Dirksen

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599648

KEYWORDS: Photomasks, Critical dimension metrology, Manufacturing, Semiconducting wafers, Design for manufacturing, Image processing, Electroluminescence, Lithography, Data modeling, Scanners

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Proceedings Article | 4 May 2005 Paper

Anti-bubble topcoat for immersion lithography

Laurent Marinier, Yuri Aksenov, Rob Morton, David Van Steenwinckel, Peter Zandbergen

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599643

KEYWORDS: Particles, Immersion lithography, Point spread functions, Pellicles, Defect detection, Monochromatic aberrations, Scanning electron microscopy, Liquids, Mie scattering, Scattering

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Showing 5 of 8 publications

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