Sherif Hany Mousa
at Siemens EDA
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11327, 1132709 (2020) https://doi.org/10.1117/12.2551829
KEYWORDS: Optical proximity correction, SRAF, Resolution enhancement technologies, Lithography, Model-based design, Manufacturing, Pattern recognition

Proceedings Article | 20 March 2018 Presentation + Paper
Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park
Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

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