Dr. Weijie Shi Profile

Dr. Weijie Shi

at Dongfang Jingyuan Electron Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper

A novel flow of full-chip OPC model calibration and verification by utilizing SEM image contours

Yuan Gan, Changlian Yan, Mengqing Yu, Penghui Zhu, Jing Qiao, Lile Lu, Shengrui Zhang, Ming Ding, Chunying Han, Weijie Shi, Xiaojun Luo, Junhai Jiang, Zongchang Yu

Proceedings Volume 12954, 129540K (2024) https://doi.org/10.1117/12.3010034

KEYWORDS: Optical proximity correction, Calibration, Contour modeling, Scanning electron microscopy, Data modeling, Data acquisition, Contour extraction, Image quality, Critical dimension metrology, Process modeling

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Proceedings Article | 1 November 2021 Paper

A scanner matching method based on covariance matrix adaptation evolution strategy

Yuguang Chen, Sikun Li, Shaobo Hu, Guodong Chen, Ming Tang, Weijie Shi, Xiangzhao Wang

Proceedings Volume 12057, 120572F (2021) https://doi.org/10.1117/12.2605879

KEYWORDS: Scanners, Particle swarm optimization, Lithography, Lithographic illumination, Particles, Computer simulations, Optimization (mathematics), Genetic algorithms, Resolution enhancement technologies, Photomasks

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SPIE Journal Paper | 9 September 2020

Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model

Ming Ding, Zhiyuan Niu, Fang Zhang, Linglin Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

JM3, Vol. 19, Issue 03, 033201, (September 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.033201

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Proceedings Article | 20 March 2019 Paper

SRAF rule extraction and insertion based on inverse lithography technology

Xiaojing Su, Pengzheng Gao, Yayi Wei, Weijie Shi

Proceedings Volume 10961, 109610P (2019) https://doi.org/10.1117/12.2511914

KEYWORDS: SRAF, Printing, Optical proximity correction, Lithography, Photomasks, Photovoltaics, Model-based design, Semiconducting wafers, Process modeling, Critical dimension metrology

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SPIE Journal Paper | 24 January 2019

Predictor of thermal aberrations via particle filter for online compensation

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

JM3, Vol. 18, Issue 01, 013502, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013502

KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

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Proceedings Article | 24 July 2018 Paper

An excellent performance optical system for freeform pupil illumination module in immersion photolithography machine

Zongshun Zeng, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Siyu Zhu, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082732 (2018) https://doi.org/10.1117/12.2501208

KEYWORDS: Optical lithography, Optical design, Fourier transforms, Device simulation, Resolution enhancement technologies, Micromirrors, Homogenization, Source mask optimization, Lens design, Optical simulations

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Proceedings Article | 24 July 2018 Paper

Flexible pupil correction technology for photolithography machine

Siyu Zhu, Zhiyuan Niu, Fang Zhang, Xiaozhe Ma, Zongshun Zeng, Weijie Shi, Aijun Zeng, Huijie Huang

Proceedings Volume 10827, 1082731 (2018) https://doi.org/10.1117/12.2501205

KEYWORDS: Optical lithography, Diffractive optical elements, Device simulation, Lithography, Critical dimension metrology, Optical design, Lithographic illumination, Optoelectronics, Resolution enhancement technologies, Standards development

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Proceedings Article | 20 March 2018 Paper

Prediction of lens heating induced aberration via particle filter in optical lithography

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

Proceedings Volume 10587, 105871K (2018) https://doi.org/10.1117/12.2297338

KEYWORDS: Particle filters, Semiconducting wafers, Lithography, Thermal modeling, Projection systems, Data modeling, Optical lithography, Manufacturing

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Showing 5 of 8 publications

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