We present performance characterization for KMLabs’ high harmonic generation (HHG) -based 13.5 nm EUV source, the XUUS4 TM. This source meets critical specifications for metrology and imaging applications, including in its long-term stability, and has been applied to ultrahigh resolution coherent diffractive imaging at 13.5 nm.
With increasingly 3D devices becoming the norm, there is a growing need in the semiconductor industry and in materials science for high spatial resolution, non-destructive metrology techniques capable of determining depth-dependent composition information on devices. We present a solution to this problem using ptychographic coherent diffractive imaging (CDI) implemented using a commercially available, tabletop 13 nm source. We present the design, simulations, and preliminary results from our new complex EUV imaging reflectometer, which uses coherent 13 nm light produced by tabletop high harmonic generation. This tool is capable of determining spatially-resolved composition vs. depth profiles for samples by recording ptychographic images at multiple incidence angles. By harnessing phase measurements, we can locally and nondestructively determine quantities such as device and thin film layer thicknesses, surface roughness, interface quality, and dopant concentration profiles. Using this advanced imaging reflectometer, we can quantitatively characterize materials-sciencerelevant and industry-relevant nanostructures for a wide variety of applications, spanning from defect and overlay metrology to the development and optimization of nano-enhanced thermoelectric or spintronic devices.
EUV lithography is promising for addressing upcoming, <10nm nodes for the semiconductor industry, but with this promise comes the need for reliable metrology techniques. In particular, there is a need for actinic mask inspection in which the imaging wavelength matches that of the intended lithography process, so that the most relevant defects are detected. Here, we demonstrate tabletop, ptychographic, coherent diffraction imaging (CDI) in reflection- and transmission-modes of extended samples, using a 13 nm high harmonic generation (HHG) source. We achieve the first sub-wavelength resolution EUV image (0.9λ) in transmission, the highest spatial resolution using any 13.5 nm source to date. We also present the first reflection-mode image obtained on a tabletop using 12.7 nm light. This work represents the first 12.7 nm reflection-mode image using any source of a general sample.
We show that it is possible to use of a train of counterpropagating light pulses to enhance
the coherent upconversion of intense femtosecond lasers into the extreme ultraviolet (EUV)
region of the spectrum. This all optical quasi-phase-matching uses interfering beams to
scramble the quantum phase of the generated EUV light, suppressing the contribution of
out-of-phase emission. Selective enhancement of up to 600X is observed at photon energies
of ~70 eV using argon gas and ~ 150 eV using helium gas.
High harmonic generation (HHG) is a useful source of coherent light in the extreme ultraviolet (EUV) region of the spectrum. However, both the conversion efficiency and the highest achievable photon energy have in the past been limited in the past by the inability to phase-match the frequency conversion process. In this paper, we summarize recent results on the development of new techniques for phase-matching the high-harmonic conversion process. We also summarize finding from three series of experiments that make use of the coherent EUV light generated using HHG: 1) probing of acoustic dynamics in materials; 2) monitoring of chemical dynamics at surfaces using photoelectron spectroscopy; and 3) time-resolved plasma imaging.
We present a simple setup for obtaining high resolution, sub-micron images using high harmonic generation (HHG) in a hollow-core waveguide as a light source. We demonstrate imaging with illumination at a wavelength of 30 nm using an all-reflective, double-multilayer mirror setup and a CCD camera as a recording device. For the magnifications of up to 50x used here, the all-reflective setup has advantages over zone plate microscopes because of the much larger working distances that allow for imaging of plasmas. This setup has also a throughput that is higher by at least a factor of three compared to zone-plate microscopes, and presents the additional advantage of preserving the temporal pulse width of the harmonics because diffractive optics are not used. This work demonstrates the feasibility of high-spatial-resolution, time-resolved, EUV imaging of plasmas and other objects using a tabletop compact light source.
The self-injection locking single frequency Yb-doped fiber ring laser is reported. The system shows compact, stable and tunable. In the primary experiment, the Self-injection locking single frequency fiber ring laser with wavelength 1.05325)mum, power exceeding 3.5mW,line-width less than 36 MHz was manufactured. The laser shows stability, low threshold and high power. No mode-hopping was observed within 2 hours. The single polarization output can be obtained when use single polarization fiber.
A diode-pumped, compact, wavelength tunable, single frequency Er3+:Yb3+ codoped DBR fiber laser is reported. An output power of 2.4mW for 75mW of 980nm diode pump power and a slope efficiency of 6% at 1557.05nm were obtained. Linewidth of the laser was estimated at 1557.05nm to be less than 1MHz. Also, the laser can be tuned to wavelengths between 1557nm to 1561nm and operates single mode throughout this range.
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