Presentation
10 April 2024 Machine learning (ML) based SEM contour extraction accelerated by GPU for etch modeling application
Author Affiliations +
Abstract
In this paper, we introduce a method that employs a deep learning model, built with GPU, to extract contours from a variety of SEM images. The model is trained with images and their corresponding ground truth. Various models are explored, and their predictive results are juxtaposed with the known ground truth. In comparison with CPU, utilizing GPU can augment the speed approximately 20 times.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuansheng Ma, Xuefeng Zeng, Yunxiang Wang, Haizhou Yin, Xiaoyuan Qi, Shibing Wang, and Le Hong "Machine learning (ML) based SEM contour extraction accelerated by GPU for etch modeling application", Proc. SPIE PC12958, Advanced Etch Technology and Process Integration for Nanopatterning XIII, (10 April 2024); https://doi.org/10.1117/12.3012442
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KEYWORDS
Scanning electron microscopy

Contour extraction

Etching

Modeling

Machine learning

Metrology

Contour modeling

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