Reactive Sputter Etching And Its Applications

Sasson Somekh

doi:10.1117/12.933574

13 September 1982 Reactive Sputter Etching And Its Applications

Sasson Somekh

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933574
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

The requirements for high-fidelity, anisotropic etching are discussed. A brief discussion on the various dry etch techniques available is followed by a description of a batch reactive sputter etch system that fulfills all patterning requirements. Examples of results obtained with this system are given and demonstrated with SEM photographs.

Citation Download Citation

Sasson Somekh "Reactive Sputter Etching And Its Applications", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933574

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