Analytical Applications Of Focused Ion Beams

N. W. Parker; W. P. Robinson; R. Levi -Setti; Y. L. Wang; G. Crow

doi:10.1117/12.947492

20 June 1985 Analytical Applications Of Focused Ion Beams

N. W. Parker, W. P. Robinson, R. Levi -Setti, Y. L. Wang, G. Crow

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947492
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

MicroBeam has under development a focused ion beam instrument intended for a wide range of applications, including microscopy (using secondary electrons), high spatial resolution microanalysis (using secondary ion mass spectrometry), and microfabrication (using ion implantation and sputtering). High collection efficiency SIMS optics enables gray scale elemental maps to be made with resolutions of 200 angstroms. Results from early application studies are presented, including high spatial resolution SIMS in microelectronics, microbiology, and cosmochemistry.

Citation Download Citation

N. W. Parker, W. P. Robinson, R. Levi -Setti, Y. L. Wang, and G. Crow "Analytical Applications Of Focused Ion Beams", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947492

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