Making CGH By Using Electron Beam

Yan Yingbai; Yu Dongxiao; Chin kuo-fan

doi:10.1117/12.939045

15 January 1988 Making CGH By Using Electron Beam

Yan Yingbai, Yu Dongxiao, Chin kuo-fan

Proceedings Volume 0673, Holography Applications; (1988) https://doi.org/10.1117/12.939045
Event: Holography Applications, 1986, Beijing, China

Abstract

The Electron-beam Lithography is a newly developed microfabrication technique. The principle and technology of making CGH by E-beam were discussed. The influences of error on the E-beam Generated Holograms have been analysed. The experimental results of the differential filters and a CGH scatter-plate have also been presented.

Citation Download Citation

Yan Yingbai, Yu Dongxiao, and Chin kuo-fan "Making CGH By Using Electron Beam", Proc. SPIE 0673, Holography Applications, (15 January 1988); https://doi.org/10.1117/12.939045

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available