Electron beam lithography and nanometer structures-fabrication of microzone plates

V. Bogli; P. Unger; H. Beneking

doi:10.1117/12.964945

1 January 1986 Electron beam lithography and nanometer structures-fabrication of microzone plates

V. Bogli, P. Unger, H. Beneking

Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964945
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany

Abstract

With the aid of a 100 keV electron beam lithography system, microzone plates have been fabricated. The system has been designed for generating structures with lateral dimensions in the below 100 nm range. The particular demands on high resolution, high efficiency imaging Fresnel zone plates and the arising problems concerning lithography and pattern transfer are discussed. We will show a step by step improvement of fabricated microzone plates with an outermost zone width of 50 nm. A thin titanium intermediate layer is used as a stable mask to generate ion milled gold absorber rings with very steep walls. The zone plates have been tested by imaging one another in an X-ray microscope, and compared to the image obtained with the holographically fabricated MZP3 microzone plate from Gottingen (Schmahl et al., /1/).

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V. Bogli, P. Unger, and H. Beneking "Electron beam lithography and nanometer structures-fabrication of microzone plates", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964945

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