Paper
30 June 1987 A Second Generation Focused Ion Beam Micromachining System
L. R. Harriott
Author Affiliations +
Abstract
We present a description of our second generation micromachining system. This machine has been developed at AT&T Bell Laboratories for applications including photomask repair, integrated circuit modification, and fabrication of integrated optical structures. The architecture incorporates many of the features and capabilities found separately in other systems, in a unique combination with emphasis on flexibility and ease of operation. The hardware features a 30 KeV Gallium beam with a one millimeter deflection field and 250 mm by 300 mm stage travel. Provisions have been made for secondary electron and ion imaging, charge neutralization, gas phase material deposition and secondary ion mass spectroscopy (SIMS).
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. R. Harriott "A Second Generation Focused Ion Beam Micromachining System", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940370
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CITATIONS
Cited by 18 scholarly publications.
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KEYWORDS
Ions

Control systems

Micromachining

Image processing

Ion beams

Signal processing

Photomasks

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