UV/Ozone Removal Of Contaminants In Spacecraft Environments

C. B. Kalem; J. R. Blanco; R. J. Champetier

doi:10.1117/12.946899

16 August 1988 UV/Ozone Removal Of Contaminants In Spacecraft Environments

C. B. Kalem, J. R. Blanco, R. J. Champetier

Proceedings Volume 0932, Ultraviolet Technology II; (1988) https://doi.org/10.1117/12.946899
Event: 1988 Technical Symposium on Optics, Electro-Optics, and Sensors, 1988, Orlando, FL, United States

Abstract

The UV/Ozone cleaning process has been studied as both a method for preventing contamin-ant films from forming on optical surfaces of a space sensor during storage, and for removing them from these surfaces after formation. Using mercury resonance lines at 253.7 and 184.9 nm and 0₂ pressures in the range of 8 x 10^-5 to 4 x 10^-4 torr, removal efficiencies from 1.8 x 10^-26 to 4.4 x 10^-26 cm³/photon were measured. The UV/Ozone process has been shown to be an effective method for preventing contaminant buildup during the storage of a sensor. If the removal efficiencies can be improved, as expected, by using higher energy photons, the UV/Ozone process should also prove to be a viable method for cleaning contaminant films from optical surfaces in space.

Citation Download Citation

C. B. Kalem, J. R. Blanco, and R. J. Champetier "UV/Ozone Removal Of Contaminants In Spacecraft Environments", Proc. SPIE 0932, Ultraviolet Technology II, (16 August 1988); https://doi.org/10.1117/12.946899

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