Calculation Of The Ambipolar Diffusion Coefficient Through Lasing Action In Gases.

P. Persephonis; B. Giannetas; R. Rigopoulos

doi:10.1117/12.968915

16 January 1988 Calculation Of The Ambipolar Diffusion Coefficient Through Lasing Action In Gases.

P. Persephonis, B. Giannetas, R. Rigopoulos

Proceedings Volume 0952, Laser Technologies in Industry; (1988) https://doi.org/10.1117/12.968915
Event: Laser Technologies in Industry, 1988, Porto, Portugal

Abstract

A new method to find the ion density of a gas at any time after the discharge is described. In this method the overvoltage of a fast discharge in a gas or its lasing action can be used. That is to say, knowing the experimental values of the actual starting voltage of a pulsed gas discharge or the laser output and comparing them with the relevant theoretical values, the ion density can be found. The result of this procedure is the calculation of the ion density at a time after the discharge equal to the inverse of the high voltage pulse repetition rate. Thus, by changing this pulse repetition rate the temporal behaviour of the ion density is found. An application to the N₂ gas leads to the calculation of the ambipolar diffusion coefficient, the value of which is in sufficient agreement with the one in the literature.

Citation Download Citation

P. Persephonis, B. Giannetas, and R. Rigopoulos "Calculation Of The Ambipolar Diffusion Coefficient Through Lasing Action In Gases.", Proc. SPIE 0952, Laser Technologies in Industry, (16 January 1988); https://doi.org/10.1117/12.968915

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