Improved multi-beam laser interference lithography system by vibration analysis model

Te Hsun Lin; Yin-Kuang Yang; Hsuan-Ying Mai; Chien-Chung Fu

doi:10.1117/12.2257111

28 March 2017 Improved multi-beam laser interference lithography system by vibration analysis model

Te Hsun Lin, Yin-Kuang Yang, Hsuan-Ying Mai, Chien-Chung Fu

Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101452O (2017) https://doi.org/10.1117/12.2257111
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

This paper has developed the multi-beam laser interference lithography (LIL) system for nano/micro pattern sapphire substrate process (PSS/NPSS). However, the multi-beam LIL system is very sensitive to the light source and the vibration. When there is a vibration source in the exposure environment, the standing wave distribution on the substrate will be affected by the vibration and move in a certain angle. As a result, Moiré fringe defects occur on the exposure result. In order to eliminate the effect of the vibration, we use the software ANSYS to analyze the resonant frequencies of our multi-beam LIL system. Therefore, we need to design new multi-beam LIL system to raise the value of resonant frequencies. The new design of the multi-beam LIL system has higher resonant frequencies and successfully eliminates the bending and rotating effect of the resonant frequencies. As a result, the new multi-beam LIL system can fabricate large area and defects free period structures.

Citation Download Citation

Te Hsun Lin, Yin-Kuang Yang, Hsuan-Ying Mai, and Chien-Chung Fu "Improved multi-beam laser interference lithography system by vibration analysis model", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452O (28 March 2017); https://doi.org/10.1117/12.2257111

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