Optics applications of chemical vapor deposited beta-SiC

Jitendra S. Goela; Michael A. Pickering

doi:10.1117/12.279816

28 July 1997 Optics applications of chemical vapor deposited beta-SiC

Jitendra S. Goela, Michael A. Pickering

Proceedings Volume 10289, Advanced Materials for Optics and Precision Structures: A Critical Review; 1028908 (1997) https://doi.org/10.1117/12.279816
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

The fabrication process, properties and optics applications of transparent and opaque chemical vapor deposited (CVD) (3-SiC are reviewed. CVD-SiC is produced by the pyrolysis of methyltrichlorosilane, in excess H₂, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter upto 1.5-m and thickness 2.5-cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicates that it is a superior material for optics applications. Important properties of CVD-SiC are compared with those of the other candidate mirror and window materials. The applications of CVDSiC for lightweight optics, x-ray telescopes, optical baffles, lens molds, optical standards and windows and domes are discussed in detail.

Citation Download Citation

Jitendra S. Goela and Michael A. Pickering "Optics applications of chemical vapor deposited beta-SiC", Proc. SPIE 10289, Advanced Materials for Optics and Precision Structures: A Critical Review, 1028908 (28 July 1997); https://doi.org/10.1117/12.279816

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