Graphene oxide reduction induced by femtosecond laser irradiation

Maren Kasischke; Stella Maragkaki; Sergej Volz; Evgeny L. Gurevich; Andreas Ostendorf

doi:10.1117/12.2274976

30 August 2017 Graphene oxide reduction induced by femtosecond laser irradiation

Maren Kasischke, Stella Maragkaki, Sergej Volz, Evgeny L. Gurevich, Andreas Ostendorf

Proceedings Volume 10356, Nanostructured Thin Films X; 103560M (2017) https://doi.org/10.1117/12.2274976
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States

Abstract

A promising fabrication method for graphene is the reduction of graphene oxide (GO), this can be achieved photochemically by laser irradiation. In this study, we examine the results of latter method by a femtosecond fiber laser (1030 nm, 280 fs). The chemical properties of the irradiated areas were analyzed by Raman and X-ray photoelectron spectroscopy (XPS) and electrical properties were evaluated using sheet resistance measurements. We found that, within a wide range of fluences (8.5 mJ/cm²to 57.8 mJ/cm²) at high overlapping rates (>99.45 %), photochemical oxygen reduction can be achieved. However, hybridization transition of sp³ to sp² graphene-like structures only takes place at upper fluences of the mentioned range.

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Maren Kasischke, Stella Maragkaki, Sergej Volz, Evgeny L. Gurevich, and Andreas Ostendorf "Graphene oxide reduction induced by femtosecond laser irradiation", Proc. SPIE 10356, Nanostructured Thin Films X, 103560M (30 August 2017); https://doi.org/10.1117/12.2274976

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