355-nm, nanosecond laser mirror thin film damage competition

Raluca A. Negres; Christopher J. Stolz; Michael D. Thomas; Mark Caputo

doi:10.1117/12.2279981

23 November 2017 355-nm, nanosecond laser mirror thin film damage competition

Raluca A. Negres, Christopher J. Stolz, Michael D. Thomas, Mark Caputo

Proceedings Volume 10447, Laser-Induced Damage in Optical Materials 2017; 104470X (2017) https://doi.org/10.1117/12.2279981
Event: SPIE Laser Damage, 2017, Boulder, Colorado, United States

Abstract

This competition aimed to survey state-of-the-art UV high reflectors. The requirements of the coatings are a minimum reflection of 99.5% at 45 degrees incidence angle for P-polarized light at 355-nm. The choice of coating materials, design, and deposition method were left to the participants. Laser damage testing was performed at a single testing facility using the raster scan method with a 5-ns pulse length laser system operating at 10 Hz in a single longitudinal mode. A double blind test assured sample and submitter anonymity. In addition to the laser damage resistance results, details of the deposition processes, cleaning method, coating materials and layer count are also shared.

Citation Download Citation

Raluca A. Negres, Christopher J. Stolz, Michael D. Thomas, and Mark Caputo "355-nm, nanosecond laser mirror thin film damage competition", Proc. SPIE 10447, Laser-Induced Damage in Optical Materials 2017, 104470X (23 November 2017); https://doi.org/10.1117/12.2279981

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