Paper
21 November 2017 Quantitative absorption data from thermally induced wavefront distortions on UV, Vis, and NIR optics
Klaus Mann, Bernd Schäfer, Uwe Leinhos, Maik Lübbecke
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Abstract
A photothermal absorption measurement system was set up, deploying a Hartmann-Shack wavefront sensor with extreme sensitivity to accomplish spatially resolved monitoring of thermally induced wavefront distortions. Photothermal absorption measurements in the near-infrared and deep ultra-violet spectral range are performed for the characterization of optical materials, utilizing a Yb fiber laser (λ = 1070 nm) and an excimer laser (193nm, 248nm) to induce thermal load. Wavefront deformations as low as 50pm (rms) can be registered, allowing for a rapid assessment of material quality. Absolute calibration of the absorption data is achieved by comparison with a thermal calculation. The method accomplishes not only to measure absorptances of plane optical elements, but also wavefront deformations and focal shifts in lenses as well as in complex optical systems, such as e.g. F-Theta objectives used in industrial high power laser applications. Along with a description of the technique we present results from absorption measurements on coated and uncoated optics at various laser wavelengths ranging from deep UV to near IR.
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Klaus Mann, Bernd Schäfer, Uwe Leinhos, and Maik Lübbecke "Quantitative absorption data from thermally induced wavefront distortions on UV, Vis, and NIR optics", Proc. SPIE 10447, Laser-Induced Damage in Optical Materials 2017, 104471W (21 November 2017); https://doi.org/10.1117/12.2282366
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Cited by 1 scholarly publication.
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KEYWORDS
Adaptive optics

Thermography

Laser beam diagnostics

Optical testing

Antireflective coatings

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