Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements

Young-Gwang Kim; Hyug-Gyo Rhee; Young-Sik Ghim; Ho-Soon Yang; Yun-Woo Lee

doi:10.1117/12.2280620

16 October 2017 Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements

Young-Gwang Kim, Hyug-Gyo Rhee, Young-Sik Ghim, Ho-Soon Yang, Yun-Woo Lee

Author Affiliations +

Proceedings Volume 10451, Photomask Technology 2017; 104511R (2017) https://doi.org/10.1117/12.2280620
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

In order to reduce the fabrication time of the diffractive optical elements (DOEs), a new process is proposed by combining the laser ablation phenomenon using the laser intensity in the conventional thermochemical process. The basic mechanism of the proposed method and experimental results are also presented. We confirmed the effect of reducing the movement distance of the stage for the production of the overall lithography when we made repetitive square patterns. The time reduction rate is drastically improved when the number of patterns is increased. Various patterns including rectangular, triangular, parallelogram, and diamond shape were fabricated by using the proposed method.

Citation Download Citation

Young-Gwang Kim, Hyug-Gyo Rhee, Young-Sik Ghim, Ho-Soon Yang, and Yun-Woo Lee "Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements", Proc. SPIE 10451, Photomask Technology 2017, 104511R (16 October 2017); https://doi.org/10.1117/12.2280620

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