CVD Replication For Optics Applications

Jitendra S. Goela; Raymond L Taylor

doi:10.1117/12.951361

11 July 1989 CVD Replication For Optics Applications

Jitendra S. Goela, Raymond L Taylor

Proceedings Volume 1047, Mirrors and Windows for High Power/High Energy Laser Systems; (1989) https://doi.org/10.1117/12.951361
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

A chemical vapor deposition process has been used to replicate shapes, patterns or highly reflective surfaces in infrared transmissive optical materials (ZnS, ZnSe) and mirror materials (Si, SiC) for a variety of applications, such as ZnS domes or meniscus lenses, ZnSe lens arrays for adaptive optics and low f-number Si/SiC mirrors for space optics. Conditions for achieving a high degree of replication are specified and replication results on several different substrate materials are presented. Techniques to obtain replication on those substrates which either are attacked in the CVD environment or whose thermal expansion coefficients are considerably different from that of the deposit are also discussed.

Citation Download Citation

Jitendra S. Goela and Raymond L Taylor "CVD Replication For Optics Applications", Proc. SPIE 1047, Mirrors and Windows for High Power/High Energy Laser Systems, (11 July 1989); https://doi.org/10.1117/12.951361

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