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21 November 2017 Computer assisted aspherical polishing: advantages and limits
Christian du Jeu
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Proceedings Volume 10569, International Conference on Space Optics — ICSO 2000; 105691J (2017) https://doi.org/10.1117/12.2307927
Event: International Conference on Space Optics 2000, 2000, Toulouse Labège, France
Abstract
SESO has increased by an important factor its capabilities of aspherical polishing with the technology of computer assisted polishing.

SESO has increased by an important factor its capabilities of aspherical polishing with the technology of computer assisted polishing. The advantages and current limitations of this technology will be discussed :

  • • New performances obtained in terms of wavefront accuracy, mid-spatial-frequency errors, roughness,

  • • Capabilities to polish aspherical surface with low F number,

  • • The link to metrology development which is a critical part of polishing performances.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Christian du Jeu "Computer assisted aspherical polishing: advantages and limits", Proc. SPIE 10569, International Conference on Space Optics — ICSO 2000, 105691J (21 November 2017); https://doi.org/10.1117/12.2307927
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KEYWORDS
Polishing
Metrology
Research management
Surface finishing
Wavefronts
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