Role of excess ligand and effect of thermal treatment in hybrid inorganic-organic EUV resists

Eric C. Mattson; Sara M. Rupich; Yasiel Cabrera; Yves J. Chabal

doi:10.1117/12.2300064

19 March 2018 Role of excess ligand and effect of thermal treatment in hybrid inorganic-organic EUV resists

Eric C. Mattson, Sara M. Rupich, Yasiel Cabrera, Yves J. Chabal

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 1058309 (2018) https://doi.org/10.1117/12.2300064
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

The chemical structure and thermal reactivity of recently discovered inorganic-organic hybrid resist materials are characterized using a combination of in situ and ex situ infrared (IR) spectroscopy and x-ray photoemission spectroscopy (XPS). The materials are comprised of a small HfOx core capped with methacrylic acid ligands that form a combined hybrid cluster, HfMAA. The observed IR modes are consistent with the calculated modes predicted from the previously determined x-ray crystal structure of the HfMAA-12 cluster, but also contain extrinsic hydroxyl groups. We find that the water content of the films is dependent on the concentration of excess ligand added to the solution. The effect of environment used during post-application baking (PAB) is studied and correlated to changes in solubility of the films. In doing so, we find that hydroxylation of the clusters results in formation of additional Hf-O-Hf linkages upon heating, which in turn impacts the solubility of the films.

Citation Download Citation

Eric C. Mattson, Sara M. Rupich, Yasiel Cabrera, and Yves J. Chabal "Role of excess ligand and effect of thermal treatment in hybrid inorganic-organic EUV resists", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058309 (19 March 2018); https://doi.org/10.1117/12.2300064

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