EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning

Hong Xu; Kou Yang; Kazunori Sakai; Vasiliki Kosma; Kazuki Kasahara; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2297266

19 March 2018 EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning

Hong Xu, Kou Yang, Kazunori Sakai, Vasiliki Kosma, Kazuki Kasahara, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 105831P (2018) https://doi.org/10.1117/12.2297266
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography, using 13.5 nm radiation, is considered one of the most prominent candidates for next generation lithography. The main challenge for EUV resists is to simultaneously satisfy resolution, LWR (line-width roughness) and sensitivity requirements according to the ITRS roadmap¹. Over the past few years, our main effort has been to focus on ZrO₂ and HfO₂ nanoparticle-based photoresists. However, both Zr and Hf are relatively low EUV absorbing metals², and integration of high EUV absorption elements is considered to be a more promising route to further improve lithographic performance under EUV radiation. Here, we demonstrate novel zinc oxide-based nanoparticle photoresists, possessing small particle size, good solubility in spin-coating solvents, good film-forming abilitie and patterning by incorporating a photo-acid generator or photo-radical generator.

Citation Download Citation

Hong Xu, Kou Yang, Kazunori Sakai, Vasiliki Kosma, Kazuki Kasahara, Emmanuel P. Giannelis, and Christopher K. Ober "EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831P (19 March 2018); https://doi.org/10.1117/12.2297266

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